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SCHEMBL10100939

SCHEMBL10100939

Cc1ccc(N(c2ccc(C)cc2)c2ccc(-c3c4nc(c(-c5ccc(N(c6ccc(C)cc6)c6ccc(C)cc6)cc5)c5ccc([nH]5)c(-c5ccc(N(c6ccc(C)cc6)c6ccc(C)cc6)cc5)c5nc(cc6ccc3[nH]6)C=C5)C=C4)cc2)cc1

nearest known ligand 0.57

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
▸ STAT3 P40763 1/20 0.57
▸ STAT1 P42224 1/20 0.57
▸ TOP1 P11387 4/20 0.47
▸ TERT O14746 6/20 0.44
▸ CYCS P99999 3/20 0.41
▸ ABCG2 Q9UNQ0 1/20 0.41
▸ ENPP2 Q13822 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10100937 0.94 STAT3 (0.52) STAT3STAT1TOP1TERTCYCS
SCHEMBL30519987 0.94 STAT3 (0.64) STAT3STAT1TOP1TERTCYCS
SCHEMBL3286041 0.94 STAT3 (0.64) STAT3STAT1TOP1TERTCYCS
SCHEMBL30574153 0.92 STAT3 (0.66) STAT3STAT1TOP1TERTCYCS
SCHEMBL8689820 0.91 STAT3 (0.68) STAT3STAT1TOP1TERTCYCS
SCHEMBL30205816 0.89 STAT3 (0.64) STAT3STAT1TOP1TERTCYCS
SCHEMBL5319095 0.89 STAT3 (0.64) STAT3STAT1TOP1TERTCYCS
Iodide SCHEMBL27581324 0.87 STAT3 (0.63) STAT3STAT1TOP1TERTCYCS
SCHEMBL93007 0.87 STAT3 (0.56) STAT3STAT1TOP1TERTCYCS
SCHEMBL5015306 0.86 STAT3 (0.73) STAT3STAT1TOP1TERTCYCS

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8207330-B2 Two-photon absorption material and application thereof RICOH COMPANY, LTD. (JP) 2012-06-26 — — US disclosed
US-8207330-B2 Two-photon absorption material and application thereof RICOH COMPANY, LTD. (JP) 2012-06-26 — — US disclosed
US-20100056775-A1 TWO-PHOTON ABSORPTION MATERIAL AND APPLICATION THEREOF RICOH COMPANY, LTD. (JP) 2010-03-04 — — US disclosed
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