SCHEMBL10105023

SCHEMBL10105023

CC(C)(CO)COC(=O)c1ccc(C(=O)O)cc1C(=O)O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SERPINE1 P05121 1/20 0.41
KDM4E B2RXH2 1/20 0.40
TDP1 Q9NUW8 2/20 0.38
ACE2 Q9BYF1 3/20 0.38
CDC25A P30304 1/20 0.37
CDC25B P30305 1/20 0.37
HSD17B10 Q99714 1/20 0.37
MYC P01106 1/20 0.37
PRKAB2 O43741 1/20 0.37
PRKAG1 P54619 1/20 0.37
PRKAA2 P54646 1/20 0.37
PRKAA1 Q13131 1/20 0.37
PRKAG3 Q9UGI9 1/20 0.37
PRKAG2 Q9UGJ0 1/20 0.37
PRKAB1 Q9Y478 1/20 0.37
POLB P06746 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
ALDH1A1 P00352 3/20 0.36
MAPK1 P28482 2/20 0.36
TSHR P16473 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11372672 0.94 KDM4E (0.43) SERPINE1KDM4ETDP1ACE2CDC25A
SCHEMBL11372670 0.90 SERPINE1 (0.45) SERPINE1KDM4ETDP1CDC25ACDC25B
Ethylene Glycol SCHEMBL5687568 0.86 KDM4E (0.40) KDM4ETDP1ACE2CDC25ACDC25B
SCHEMBL1104259 0.83 KDM4E (0.43) SERPINE1KDM4ETDP1ACE2CDC25A
SCHEMBL9723920 0.82 ALDH1A1 (0.54) TDP1L3MBTL1ALDH1A1MAPK1TSHR
SCHEMBL3453488 0.82 MAPT (0.49) SERPINE1TDP1ALDH1A1MAPK1TSHR
SCHEMBL6061019 0.81 SERPINE1 (0.44) SERPINE1KDM4ETDP1HSD17B10PRKAB2
SCHEMBL10101380 0.80 ALDH1A1 (0.38) SERPINE1KDM4ETDP1PRKAB2PRKAG1
Ethylene Glycol SCHEMBL5687572 0.80 KDM4E (0.43) KDM4ETDP1ACE2CDC25ACDC25B
Terephthalic Acid SCHEMBL6690763 0.80 MAPK1 (0.45) SERPINE1TDP1POLBALDH1A1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8557948-B2 Photosensitive composition, photosensitive film, photosensitive laminate, method of forming a permanent pattern, and printed board FUJIFILM CORPORATION (JP) 2013-10-15 US disclosed
US-20120048594-A1 PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE FILM, PHOTOSENSITIVE LAMINATE, METHOD OF FORMING A PERMANENT PATTERN, AND PRINTED BOARD FUJIFILM CORPORATION (JP) 2012-03-01 US disclosed