Bromide

Bromide

SCHEMBL1011285

Br.CCCCCCCCCCCCCCC(CC)C(N)(CC)CC

nearest known ligand 0.42

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3APH1AAPH1BCHRM2CHRM3EZH2GRIN2AHTR1AHTR1BHTR1DHTR1FHTR3ANCSTNP2RY12PSEN1PSEN2PSENENSIGMAR1SLC6A2SLC6A3SLC6A4

The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FDPS P14324 1/20 0.42
OPRM1 P35372 1/20 0.41
SPHK1 Q9NYA1 2/20 0.39
DNM1 Q05193 6/20 0.39
LMNA P02545 2/20 0.38
CYP2D6 P10635 2/20 0.36
PLA2G1B P04054 1/20 0.36
PLA2G2A P14555 1/20 0.36
GMNN O75496 1/20 0.36
POLB P06746 1/20 0.36
THPO P40225 1/20 0.36
MTOR P42345 1/20 0.36
BLM P54132 1/20 0.36
KDM4E B2RXH2 1/20 0.36
TP53 P04637 1/20 0.36
CYP1A2 P05177 1/20 0.36
CYP3A4 P08684 1/20 0.36
MAPT P10636 1/20 0.36
CETP P11597 1/20 0.36
HTT P42858 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL5088172 1.00 FDPS (0.42) FDPSOPRM1SPHK1DNM1LMNA
Bromide SCHEMBL5088450 1.00 FDPS (0.42) FDPSOPRM1SPHK1DNM1LMNA
Bromide SCHEMBL5088644 1.00 FDPS (0.42) FDPSOPRM1SPHK1DNM1LMNA
Bromide SCHEMBL5084911 1.00 FDPS (0.42) FDPSOPRM1SPHK1DNM1LMNA
Bromide SCHEMBL5087965 1.00 FDPS (0.42) FDPSOPRM1SPHK1DNM1LMNA
Bromide SCHEMBL5087875 1.00 FDPS (0.42) FDPSOPRM1SPHK1DNM1LMNA
Bromide SCHEMBL5091658 1.00 FDPS (0.42) FDPSOPRM1SPHK1DNM1LMNA
SCHEMBL414859 0.98 FDPS (0.44) FDPSOPRM1SPHK1DNM1LMNA
SCHEMBL332946 0.98 FDPS (0.44) FDPSOPRM1SPHK1DNM1LMNA
SCHEMBL29201295 0.98 FDPS (0.44) FDPSOPRM1SPHK1DNM1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112795998-B Preparation method of non-intrinsic flame-retardant high-strength polyester industrial yarn 湖南美莱珀科技发展有限公司 2022-05-31 CN claimed
CN-112812285-B Macromolecular flame retardant and preparation method and application thereof 湖南美莱珀科技发展有限公司 2022-05-06 CN claimed
CN-112812285-A Macromolecular flame retardant and preparation method and application thereof 湖南美莱珀科技发展有限公司 2021-05-18 CN claimed
CN-112795998-A Preparation method of non-intrinsic flame-retardant high-strength polyester industrial yarn 湖南美莱珀科技发展有限公司 2021-05-14 CN claimed
CN-109678871-B Method for preparing bisbenzylisoquinoline compounds 山东师范大学 2020-09-29 CN claimed
US-4946977-A CATALYTIC REACTING ALKALI (METH)ACRYLATE WITH HALOGEN ALKYLALKOXYSILANE HUELS TROISDORF AG (DE) 1990-08-07 US claimed
CN-112795998-B Preparation method of non-intrinsic flame-retardant high-strength polyester industrial yarn 湖南美莱珀科技发展有限公司 2022-05-31 CN disclosed
CN-112812285-B Macromolecular flame retardant and preparation method and application thereof 湖南美莱珀科技发展有限公司 2022-05-06 CN disclosed
EP-3310792-B1 PROCESS FOR PREPARING AN ACRYLOYLOXYSILANE DOW SILICONES CORP (US) 2021-07-21 EP disclosed
EP-3310793-B1 PROCESS FOR PREPARING AN ACRYLOYLOXYSILANE DOW SILICONES CORP (US) 2021-06-09 EP disclosed
CN-112812285-A Macromolecular flame retardant and preparation method and application thereof 湖南美莱珀科技发展有限公司 2021-05-18 CN disclosed
CN-112795998-A Preparation method of non-intrinsic flame-retardant high-strength polyester industrial yarn 湖南美莱珀科技发展有限公司 2021-05-14 CN disclosed
CN-107743493-B Process for preparing acryloxysilanes 美国陶氏有机硅公司 2020-10-30 CN disclosed
US-20070112088-A1 Curable composition, ink composition, inkjet recording method, printer matter, method for producing planographic printing plate, planographic printing plate and oxetane compound FUJIFILM CORPORATION 2007-05-17 US disclosed
EP-1783184-A1 Curable ink composition and oxetane compound Fujifilm Corporation (JP) 2007-05-09 EP disclosed
EP-1770133-A1 Curable composition, ink composition, inkjet recording method, printed material, method of producing planographic printing plate, and planographic printing plate FUJIFILM Corporation (JP) 2007-04-04 EP disclosed
US-20070071952-A1 Curable composition, ink composition, inkjet recording method, printed material, method of producing planographic printing plate, and planographic printing plate FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed
US-20070049651-A1 Curable composition, ink composition, inkjet recording method, printed material, method of producing planographic printing plate, planographic printing plate, and oxcetane compound FUJI PHOTO FILM CO., LTD. 2007-03-01 US disclosed
EP-1757635-A1 Curable modified oxetane compound and ink composition comprising it Fuji Photo Film Co., Ltd. (JP) 2007-02-28 EP disclosed
US-4946977-A CATALYTIC REACTING ALKALI (METH)ACRYLATE WITH HALOGEN ALKYLALKOXYSILANE HUELS TROISDORF AG (DE) 1990-08-07 US disclosed