⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12134231 | 0.86 | MEN1 (0.35) | — | |
| SCHEMBL12134282 | 0.84 | ABCB11 (0.32) | — | |
| SCHEMBL12134281 | 0.84 | ABCB11 (0.32) | — | |
| SCHEMBL12134280 | 0.79 | TSHR (0.33) | — | |
| SCHEMBL12134217 | 0.78 | TSHR (0.31) | — | |
| SCHEMBL13840904 | 0.77 | CES1 (0.40) | — | |
| SCHEMBL12134228 | 0.77 | CYP4F2 (0.34) | — | |
| SCHEMBL10122780 | 0.77 | — | — | |
| SCHEMBL12134244 | 0.77 | MEN1 (0.31) | — | |
| SCHEMBL13840902 | 0.76 | HDAC1 (0.44) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8110336-B2 | Resin and chemically amplified resist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-07 | — | — | US | disclosed |
| US-8071270-B2 | Polyhydric compound and chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-12-06 | — | — | US | disclosed |
| US-20100075257-A1 | Resin and Chemically Amplified Resist Composition Comprising the Same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-03-25 | — | — | US | disclosed |
| US-20090220886-A1 | POLYHYDRIC COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-09-03 | — | — | US | disclosed |