SCHEMBL1013194

SCHEMBL1013194

O=C1CCCCC(OCC(CO)(CO)CO)O1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5029545 0.98
SCHEMBL292028 0.75 CA1 (0.36)
SCHEMBL11583470 0.73 CA1 (0.35)
SCHEMBL6932463 0.71 CHRM2 (0.30)
SCHEMBL9062176 0.71 MEN1 (0.33)
SCHEMBL3078865 0.69 MEN1 (0.38)
SCHEMBL11205480 0.69 CA1 (0.38)
SCHEMBL11581889 0.69 CA1 (0.38)
SCHEMBL7590787 0.69 CYP1A2 (0.44)
SCHEMBL1330930 0.69 CYP2D6 (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107744503-B Preparation method of enzyme-sensitive amphiphilic polyester MePEG-Peptide-PER-CL administration nanoparticle 浙江工业大学 2020-04-07 CN claimed
US-10717896-B2 Curable heat radiation composition SHOWA DENKO K.K. (JP) 2020-07-21 US disclosed
CN-107744503-B Preparation method of enzyme-sensitive amphiphilic polyester MePEG-Peptide-PER-CL administration nanoparticle 浙江工业大学 2020-04-07 CN disclosed
US-20170283645-A1 CURABLE HEAT RADIATION COMPOSITION SHOWA DENKO K.K. (JP) 2017-10-05 US disclosed
US-20150037575-A1 CURABLE HEAT RADIATION COMPOSITION SHOWA DENKO K.K. (JP) 2015-02-05 US disclosed
US-20140078234-A1 IMAGE PROCESSING METHOD AND IMAGE PROCESSING APPARATUS RICOH COMPANY, LTD. (JP) 2014-03-20 US disclosed
EP-2269828-B1 Image processing method and image processing apparatus RICOH CO LTD (JP) 2012-12-12 EP disclosed
US-8264513-B2 Method for image processing and image processing apparatus RICOH COMPANY, LTD. (JP) 2012-09-11 US disclosed
EP-1834796-B1 Image processing method and image processing apparatus RICOH CO LTD (JP) 2011-09-14 EP disclosed
EP-2269828-A1 Image processing method and image processing apparatus Ricoh Company, Ltd. (JP) 2011-01-05 EP disclosed
US-7728860-B2 Method for image processing and image processing apparatus RICOH COMPANY, LTD. (JP) 2010-06-01 US disclosed
US-20100061198-A1 METHOD FOR IMAGE PROCESSING AND IMAGE PROCESSING APPARATUS RICOH COMPANY, LTD. (JP) 2010-03-11 US disclosed
US-7439993-B2 Image processing method and image processing apparatus RICOH COMPANY, LTD. (JP) 2008-10-21 US disclosed
US-20070285488-A1 Image processing method and image processing apparatus RICOH COMPANY, LTD. (JP) 2007-12-13 US disclosed
US-20070225162-A1 Image processing method and image processing apparatus RICOH COMPANY, LTD. (JP) 2007-09-27 US disclosed
EP-1834795-A1 Image processing method and image processing apparatus Ricoh Company, Ltd. (JP) 2007-09-19 EP disclosed
EP-1834796-A2 Image processing method and image processing apparatus Ricoh Company, Ltd. (JP) 2007-09-19 EP disclosed
US-20070036039-A1 Method for image processing and image processing apparatus RICOH COMPANY, LTD. (JP) 2007-02-15 US disclosed
EP-1752298-A1 Method for image processing and image processing apparatus Ricoh Company, Ltd. (JP) 2007-02-14 EP disclosed
JP-2002105342-A CURING COMPOSITION IMPROVED IN WEATHERABILITY ASAHI GLASS CO LTD 2002-04-10 JP disclosed