Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.53 |
| ▸ | TSHR | P16473 | 3/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | APEX1 | P27695 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | MGAM | O43451 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | SI | P14410 | 1/20 | 0.33 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.33 |
| ▸ | CES2 | O00748 | 1/20 | 0.32 |
| ▸ | PLOD2 | O00469 | 1/20 | 0.31 |
| ▸ | PLOD3 | O60568 | 1/20 | 0.31 |
| ▸ | PLOD1 | Q02809 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7758566 | 0.85 | THRB (0.63) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL62134 | 0.80 | THRB (0.57) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL21880923 | 0.80 | THRB (0.57) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL15263096 | 0.80 | THRB (0.57) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL7782426 | 0.80 | THRB (0.57) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL13979456 | 0.79 | THRB (0.61) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL13557175 | 0.79 | THRB (0.52) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL12394966 | 0.79 | THRB (0.61) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL2625700 | 0.79 | THRB (0.52) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL12394964 | 0.79 | THRB (0.61) | THRBTSHRALDH1A1POLBAPEX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230221644-A1 | METHOD FOR PRODUCING COMPOSITION FOR FORMING NON-PHOTOSENSITIVE UPPER LAYER FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-07-13 | — | — | US | disclosed |
| US-20230221644-A1 | METHOD FOR PRODUCING COMPOSITION FOR FORMING NON-PHOTOSENSITIVE UPPER LAYER FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-07-13 | — | — | US | disclosed |
| US-9926462-B2 | Composition for forming liquid immersion upper layer film, and polymer | JSR CORPORATION (JP) | 2018-03-27 | — | — | US | disclosed |
| US-9926462-B2 | Composition for forming liquid immersion upper layer film, and polymer | JSR CORPORATION (JP) | 2018-03-27 | — | — | US | disclosed |
| US-9926462-B2 | Composition for forming liquid immersion upper layer film, and polymer | JSR CORPORATION (JP) | 2018-03-27 | — | — | US | disclosed |
| US-20170073541-A1 | COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, AND POLYMER | JSR CORPORATION (JP) | 2017-03-16 | — | — | US | disclosed |
| US-20170073541-A1 | COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, AND POLYMER | JSR CORPORATION (JP) | 2017-03-16 | — | — | US | disclosed |
| US-20170073541-A1 | COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, AND POLYMER | JSR CORPORATION (JP) | 2017-03-16 | — | — | US | disclosed |
| US-9540535-B2 | Composition for forming liquid immersion upper layer film, and polymer | JSR CORPORATION (JP) | 2017-01-10 | — | — | US | disclosed |
| US-9540535-B2 | Composition for forming liquid immersion upper layer film, and polymer | JSR CORPORATION (JP) | 2017-01-10 | — | — | US | disclosed |
| US-9540535-B2 | Composition for forming liquid immersion upper layer film, and polymer | JSR CORPORATION (JP) | 2017-01-10 | — | — | US | disclosed |
| US-20130217850-A1 | COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, AND POLYMER | JSR CORPORATION (JP) | 2013-08-22 | — | — | US | disclosed |
| US-20130217850-A1 | COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, AND POLYMER | JSR CORPORATION (JP) | 2013-08-22 | — | — | US | disclosed |
| US-20130217850-A1 | COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, AND POLYMER | JSR CORPORATION (JP) | 2013-08-22 | — | — | US | disclosed |
| US-20120034560-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND POLYMER | JSR CORPORATION (JP) | 2012-02-09 | — | — | US | disclosed |
| US-20120034560-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND POLYMER | JSR CORPORATION (JP) | 2012-02-09 | — | — | US | disclosed |
| US-7507525-B2 | Polymerizable composition and lithographic printing plate precursor | FUJIFILM CORPORATION (JP) | 2009-03-24 | — | — | US | disclosed |
| US-7279539-B2 | Alkali-soluble polymer and polymerizable composition thereof | FUJIFILM CORPORATION (JP) | 2007-10-09 | — | — | US | disclosed |
| US-7232644-B2 | Polymerizable composition and negative-working planographic printing plate precursor using the same | FUJIFILM CORPORATION (JP) | 2007-06-19 | — | — | US | disclosed |