⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10241244 | 0.84 | — | — | |
| SCHEMBL22062189 | 0.76 | — | — | |
| SCHEMBL24653287 | 0.76 | — | — | |
| SCHEMBL13765655 | 0.71 | — | — | |
| SCHEMBL14491249 | 0.71 | — | — | |
| Ammonia Solution, Strong SCHEMBL6014569 | 0.69 | — | — | |
| SCHEMBL14510016 | 0.68 | — | — | |
| SCHEMBL21185617 | 0.67 | SI (0.31) | — | |
| SCHEMBL18662522 | 0.67 | SI (0.31) | — | |
| SCHEMBL13714724 | 0.67 | GBA1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1645908-B1 | Positive resist composition and pattern-forming method using the same | FUJIFILM CORP (JP) | 2013-01-09 | — | — | EP | disclosed |
| EP-2009498-B1 | Pattern forming method | FUJIFILM CORP (JP) | 2012-03-28 | — | — | EP | disclosed |
| US-7563558-B2 | Negative resists based on acid-catalyzed elimination of polar molecules | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-07-21 | — | — | US | disclosed |
| US-20080233517-A1 | Negative Resists Based on Acid-Catalyzed Elimination of Polar Molecules | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-09-25 | — | — | US | disclosed |
| US-7393624-B2 | Negative resists based on acid-catalyzed elimination of polar molecules | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-07-01 | — | — | US | disclosed |
| US-7300739-B2 | Negative resists based on a acid-catalyzed elimination of polar molecules | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-11-27 | — | — | US | disclosed |
| US-20070259274-A1 | Negative resists based on acid-catalyzed elimination of polar molecules | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-11-08 | — | — | US | disclosed |
| US-20070026339-A1 | NEGATIVE RESISTS BASED ON A ACID-CATALYZED ELIMINATION OF POLAR MOLECULES | GLOBALFOUNDRIES U.S. INC. | 2007-02-01 | — | — | US | disclosed |