SCHEMBL1016465

SCHEMBL1016465

CC=CCCCOC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL765792 1.00
SCHEMBL64720 1.00
SCHEMBL8003221 0.92
SCHEMBL1017304 0.92
SCHEMBL5853223 0.90 ALDH1A1 (0.43)
SCHEMBL5854733 0.90 ALDH1A1 (0.43)
SCHEMBL1017052 0.90 ALDH1A1 (0.43)
SCHEMBL5853219 0.90 ALDH1A1 (0.43)
SCHEMBL7119152 0.90 ALDH1A1 (0.43)
SCHEMBL5854738 0.90 ALDH1A1 (0.43)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120048294-A Photopolymer holographic recording medium, preparation method and application thereof 珠海莫界科技有限公司 2025-05-27 CN claimed
CN-120048294-A Photopolymer holographic recording medium, preparation method and application thereof 珠海莫界科技有限公司 2025-05-27 CN disclosed
US-8288066-B2 Electroconductive support with a photosensitive layer of an arylamine-based compound; high sensitivity, chargeability, residual potential, light resistance MITSUBISHI CHEMICAL CORPORATION (JP) 2012-10-16 US disclosed
US-8247595-B2 Organic sulfur compound and its use for controlling harmful arthropod SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-08-21 US disclosed
EP-2487149-A1 METHOD FOR PRODUCING KETONE JX Nippon Oil & Energy Corporation (JP) 2012-08-15 EP disclosed
US-20120197036-A1 METHOD FOR MANUFACTURING KETONE OSAKA UNIVERSITY (JP) 2012-08-02 US disclosed
US-7981581-B2 Halogenated phthalocyanine compounds; high sensitivity, small environmental dependence, only small fluctuations in electrical properties when the usage environment varies during repeated use MITSUBISHI CHEMICAL CORPORATION (JP) 2011-07-19 US disclosed
EP-2152668-B1 ORGANIC SULFUR COMPOUND AND ITS USE FOR CONTROLLING HARMFUL ARTHROPODS SUMITOMO CHEMICAL CO (JP) 2011-01-12 EP disclosed
US-20100160434-A1 ORGANIC SULFUR COMPOUND AND ITS USE FOR CONTROLLING HARMFUL ARTHROPOD SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-06-24 US disclosed
EP-2152668-A1 ORGANIC SULFUR COMPOUND AND ITS USE FOR CONTROLLING HARMFUL ARTHROPOD Sumitomo Chemical Company, Limited (JP) 2010-02-17 EP disclosed
EP-2084255-A1 FRAGRANCE COMPOSITIONS Givaudan Nederland Services B.V. (NL) 2009-08-05 EP disclosed
WO-2008143338-A1 ORGANIC SULFUR COMPOUND AND ITS USE FOR CONTROLLING HARMFUL ARTHROPOD SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-11-27 WO disclosed
US-20080268357-A1 Phthalocyanine Composition and Photoconductive Material, Electrophotographic Photoreceptor Cartridge, and Image-Forming Apparatus Each Employing the Composition MITSUBISHI CHEMICAL CORPORATION (JP) 2008-10-30 US disclosed
US-20080193867-A1 Electrophotographic Photoreceptor and Image-Forming Apparatus MITSUBISHI CHEMICAL CORPORATION (JP) 2008-08-14 US disclosed
WO-2008050086-A1 FRAGRANCE COMPOSITIONS GIVAUDAN NEDERLAND SERVICES B.V. (NL) 2008-05-02 WO disclosed