SCHEMBL10165263

SCHEMBL10165263

CC(=O)OC(C)(C)C1CC2CC1C1CCCC21

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 1/20 0.36
RAB9A P51151 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
MAPT P10636 3/20 0.35
ALDH1A1 P00352 3/20 0.35
CA12 O43570 2/20 0.35
GMNN O75496 2/20 0.35
CA1 P00915 2/20 0.35
CA2 P00918 2/20 0.35
LMNA P02545 2/20 0.35
BLM P54132 2/20 0.35
CA9 Q16790 2/20 0.35
TDP1 Q9NUW8 2/20 0.35
SGMS1 Q86VZ5 1/20 0.35
SGMS2 Q8NHU3 1/20 0.35
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
KDM4E B2RXH2 1/20 0.34
TP53 P04637 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12320522 0.97 NPC1 (0.33) NPC1RAB9ANPSR1L3MBTL1MAPT
SCHEMBL15206834 0.86 NPC1 (0.34) NPC1RAB9ANPSR1L3MBTL1MAPT
SCHEMBL26939583 0.82 NPC1 (0.36) NPC1RAB9ANPSR1L3MBTL1MAPT
SCHEMBL6726487 0.82 NPC1 (0.33) NPC1RAB9ANPSR1L3MBTL1MAPT
SCHEMBL26939178 0.81 L3MBTL1 (0.38) NPC1RAB9ANPSR1L3MBTL1MAPT
SCHEMBL15216636 0.81 NPC1 (0.33) NPC1RAB9ANPSR1L3MBTL1MAPT
SCHEMBL13115530 0.81 CHRM2 (0.32)
SCHEMBL26939363 0.80 NPC1 (0.34) NPC1RAB9ANPSR1L3MBTL1MAPT
SCHEMBL26939796 0.78 NPC1 (0.33) NPC1RAB9ANPSR1L3MBTL1MAPT
SCHEMBL10061919 0.78 MAPT (0.36) NPC1RAB9ANPSR1L3MBTL1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124314-B2 Radiation-sensitive composition JSR CORPORATION (JP) 2012-02-28 US disclosed
US-20110212401-A1 RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD JSR CORPORATION (JP) 2011-09-01 US disclosed
US-20110212401-A1 RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD JSR CORPORATION (JP) 2011-09-01 US disclosed
EP-1164434-B1 Radiation-sensitive resin composition JSR CORP (JP) 2010-10-06 EP disclosed
US-20100221664-A1 RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2010-09-02 US disclosed
WO-2010029982-A1 RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD JSR株式会社 (JP) 2010-03-18 WO disclosed
US-20080051536-A1 Method for Producing (Co) Polymer Having Carboxyl Group JSR CORPORATION (JP) 2008-02-28 US disclosed
US-20080051536-A1 Method for Producing (Co) Polymer Having Carboxyl Group JSR CORPORATION (JP) 2008-02-28 US disclosed
US-20070254247-A1 Radiation-sensitive resin composition YAMAMOTO MASAFUMI 2007-11-01 US disclosed
US-20070254247-A1 Radiation-sensitive resin composition YAMAMOTO MASAFUMI 2007-11-01 US disclosed
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed