SCHEMBL10169169

SCHEMBL10169169

C=CC(=O)OC12CC3CC(C1)CC(C(=O)OCCC(F)(F)CC(F)(F)C(F)(F)F)(C3)C2

nearest known ligand 0.37

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 1/20 0.37
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10169166 0.85 NPSR1 (0.39) NPSR1
SCHEMBL10169173 0.84
SCHEMBL2607816 0.82 NPSR1 (0.38) NPSR1
SCHEMBL14226592 0.82 NPSR1 (0.38) NPSR1
SCHEMBL10169161 0.77
SCHEMBL17446710 0.76 NPSR1 (0.41) NPSR1ALDH1A1
SCHEMBL10134890 0.76 NPSR1 (0.34) NPSR1ALDH1A1
SCHEMBL20668205 0.76 NPSR1 (0.42) NPSR1ALDH1A1
SCHEMBL25787977 0.76 NPSR1 (0.33) NPSR1ALDH1A1
SCHEMBL13450026 0.75 NPSR1 (0.43) NPSR1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9229320-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-01-05 US disclosed
US-20120034563-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-09 US disclosed