SCHEMBL10169166

SCHEMBL10169166

C=C(C)C(=O)OC12CC3CC(C1)CC(C(=O)OCCC(F)(F)CC(F)(F)C(F)(F)F)(C3)C2

nearest known ligand 0.39

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 1/20 0.39
RXFP1 Q9HBX9 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20668205 0.92 NPSR1 (0.42) NPSR1RXFP1
SCHEMBL20668203 0.88 NPSR1 (0.40) NPSR1RXFP1
SCHEMBL20668206 0.87 NPSR1 (0.46) NPSR1RXFP1
SCHEMBL22266849 0.87 NPSR1 (0.40) NPSR1RXFP1
SCHEMBL27008287 0.87 NPSR1 (0.41) NPSR1RXFP1
SCHEMBL26312816 0.85 NPSR1 (0.38) NPSR1RXFP1
SCHEMBL10169169 0.85 NPSR1 (0.37) NPSR1
SCHEMBL10169180 0.84
SCHEMBL20668454 0.83 NPSR1 (0.42) NPSR1RXFP1
SCHEMBL24400982 0.83 NPSR1 (0.38) NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9229320-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-01-05 US disclosed
US-20120034563-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-09 US disclosed