SCHEMBL10171201

SCHEMBL10171201

C=C(C)C(=O)OCCOC(=O)C(F)(F)CC(F)(F)C(=O)OC(C(C)C)C(C)C

nearest known ligand 0.41

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.41
TSHR P16473 3/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10171114 0.89 THRB (0.42) THRBTSHR
SCHEMBL10172177 0.83 TSHR (0.46) THRBTSHR
SCHEMBL10172178 0.82 TSHR (0.49) THRBTSHR
SCHEMBL10171107 0.81 THRB (0.46) THRBTSHR
SCHEMBL10171110 0.81 THRB (0.54) THRBTSHR
SCHEMBL10171203 0.81 TSHR (0.41) THRBTSHR
SCHEMBL2625699 0.81 THRB (0.49) THRBTSHR
SCHEMBL13557189 0.78 THRB (0.44) THRBTSHR
SCHEMBL13557193 0.78 THRB (0.46) THRBTSHR
SCHEMBL13557181 0.77 THRB (0.45) THRBTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8574811-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-11-05 US disclosed
US-20120052443-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-01 US disclosed