SCHEMBL10171998

SCHEMBL10171998

CCCCC(C)(F)C(=O)OCC(=O)OCC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.44

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.44
KMT2A Q03164 4/20 0.44
L3MBTL1 Q9Y468 2/20 0.44
ALDH1A1 P00352 3/20 0.43
EPHX2 P34913 8/20 0.37
CA12 O43570 1/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
CA9 Q16790 1/20 0.35
MAPT P10636 1/20 0.34
ATM Q13315 1/20 0.34
LMNA P02545 1/20 0.32
CNR2 P34972 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16708404 0.95 MEN1 (0.42) MEN1KMT2AL3MBTL1ALDH1A1EPHX2
SCHEMBL12346442 0.91 MEN1 (0.49) MEN1KMT2AL3MBTL1ALDH1A1EPHX2
SCHEMBL12346444 0.86 MEN1 (0.47) MEN1KMT2AL3MBTL1ALDH1A1EPHX2
SCHEMBL10216368 0.84 MEN1 (0.41) MEN1KMT2AL3MBTL1ALDH1A1EPHX2
SCHEMBL685881 0.83 ALDH1A1 (0.47) MEN1KMT2AL3MBTL1ALDH1A1EPHX2
SCHEMBL685875 0.83 ALDH1A1 (0.47) MEN1KMT2AL3MBTL1ALDH1A1EPHX2
SCHEMBL13719090 0.81 MEN1 (0.39) MEN1KMT2AL3MBTL1ALDH1A1EPHX2
SCHEMBL685878 0.81 ALDH1A1 (0.44) MEN1KMT2AL3MBTL1ALDH1A1EPHX2
SCHEMBL12346469 0.80 MEN1 (0.38) MEN1KMT2AL3MBTL1ALDH1A1EPHX2
SCHEMBL16708390 0.80 MEN1 (0.38) MEN1KMT2AL3MBTL1ALDH1A1EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8921029-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-12-30 US disclosed
US-8574811-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-11-05 US disclosed
US-20130022917-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-01-24 US disclosed
US-20120052443-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-01 US disclosed