SCHEMBL10174223

SCHEMBL10174223

CCC(C)C(=O)Nc1ccc(C(=O)O)cc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.60
CA2 P00918 1/20 0.60
CA7 P43166 1/20 0.60
CA14 Q9ULX7 1/20 0.60
HSD17B10 Q99714 2/20 0.56
SMN1; SMN2 Q16637 2/20 0.54
RAB9A P51151 3/20 0.50
ALDH1A1 P00352 3/20 0.50
MEN1 O00255 2/20 0.50
KMT2A Q03164 2/20 0.50
HPGD P15428 1/20 0.50
HTT P42858 1/20 0.50
NPSR1 Q6W5P4 1/20 0.50
KDM4E B2RXH2 2/20 0.49
HDAC3 O15379 3/20 0.48
HDAC4 P56524 3/20 0.48
HDAC1 Q13547 3/20 0.48
HDAC7 Q8WUI4 3/20 0.48
HDAC2 Q92769 3/20 0.48
HDAC10 Q969S8 3/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13761374 0.86 CA1 (0.60) CA1CA2CA7CA14HSD17B10
SCHEMBL24243429 0.85 HSD17B10 (0.77) CA1CA2CA7CA14HSD17B10
SCHEMBL10438814 0.85 HSD17B10 (0.51) CA1CA2CA7CA14HSD17B10
SCHEMBL10438815 0.85 HSD17B10 (0.51) CA1CA2CA7CA14HSD17B10
SCHEMBL12205972 0.84 MME (0.63) CA1CA2CA7CA14HSD17B10
SCHEMBL18456226 0.84 MME (0.63) CA1CA2CA7CA14HSD17B10
SCHEMBL4151615 0.84 MME (0.63) CA1CA2CA7CA14HSD17B10
SCHEMBL14369278 0.83 CA1 (0.57) CA1CA2CA7CA14HSD17B10
SCHEMBL12125174 0.82 CA1 (0.64) CA1CA2CA7CA14HSD17B10
SCHEMBL97700 0.82 CA1 (0.64) CA1CA2CA7CA14HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230159827-A1 LIQUID CRYSTAL COMPOSITION, FLUORINE-CONTAINING POLYMER, OPTICALLY ANISOTROPIC LAYER, LAMINATE, AND IMAGE DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-05-25 US disclosed
US-8124317-B2 Planographic printing plate precursor and method of producing a copolymer used therein FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-7955781-B2 Negative-working photosensitive material and negative-working planographic printing plate precursor FUJIFILM CORPORATION (JP) 2011-06-07 US disclosed
US-20090233221-A1 NEGATIVE-WORKING PHOTOSENSITIVE MATERIAL AND NEGATIVE-WORKING PLANOGRAPHIC PRINTING PLATE PRECURSOR FUJIFILM CORPORATION (JP) 2009-09-17 US disclosed
US-20090087787-A1 PLANOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PRODUCING A COPOLYMER USED THEREIN FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-20090087780-A1 NEGATIVE-WORKING PHOTOSENSITIVE MATERIAL AND NEGATIVE-WORKING PLANOGRAPHIC PRINTING PLATE PRECURSOR FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed