SCHEMBL97700

SCHEMBL97700

CCC(C)C(=O)Nc1ccc(O)cc1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.64
CA2 P00918 3/20 0.64
CA7 P43166 3/20 0.64
CA14 Q9ULX7 3/20 0.64
HSD17B10 Q99714 2/20 0.53
MAPT P10636 2/20 0.53
CRHBP P24387 2/20 0.53
CRHR2 Q13324 2/20 0.53
GAA P10253 1/20 0.53
SMN1; SMN2 Q16637 1/20 0.53
KMT2A Q03164 4/20 0.52
MEN1 O00255 3/20 0.52
CA12 O43570 1/20 0.52
BRD4 O60885 1/20 0.52
NR1I2 O75469 1/20 0.52
ALDH1A1 P00352 1/20 0.52
MB P02144 1/20 0.52
CYP1A1 P04798 1/20 0.52
CA3 P07451 1/20 0.52
CYP3A4 P08684 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2742157 0.86 CA1 (0.50) CA1CA2CA7CA14HSD17B10
SCHEMBL12125174 0.85 CA1 (0.64) CA1CA2CA7CA14HSD17B10
SCHEMBL5150082 0.84 CA1 (0.62) CA1CA2CA7CA14HSD17B10
SCHEMBL20852746 0.84 CA1 (0.62) CA1CA2CA7CA14HSD17B10
SCHEMBL22002689 0.84 CA1 (0.62) CA1CA2CA7CA14HSD17B10
SCHEMBL19965677 0.84 CA1 (0.62) CA1CA2CA7CA14HSD17B10
SCHEMBL13046444 0.84 CA1 (0.62) CA1CA2CA7CA14HSD17B10
SCHEMBL18456226 0.83 MME (0.63) CA1CA2CA7CA14HSD17B10
SCHEMBL12205972 0.83 MME (0.63) CA1CA2CA7CA14HSD17B10
SCHEMBL4151615 0.83 MME (0.63) CA1CA2CA7CA14HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4563573-A1 COMPOUND, AND PREPARATION METHOD THEREFOR AND USE THEREOF IN PREPARATION OF SEH INHIBITOR AND PPARS AGONIST Shenyang Pharmaceutical University (CN) 2025-06-04 EP disclosed
WO-2024193129-A1 COMPOUND, AND PREPARATION METHOD THEREFOR AND USE THEREOF IN PREPARATION OF SEH INHIBITOR AND PPARS AGONIST 沈阳药科大学 2024-09-26 WO disclosed
US-12044968-B2 Protective film-forming composition having acetal structure and amide structure NISSAN CHEMICAL CORPORATION (JP) 2024-07-23 US disclosed
US-12044968-B2 Protective film-forming composition having acetal structure and amide structure NISSAN CHEMICAL CORPORATION (JP) 2024-07-23 US disclosed
CN-118206473-A Compound, preparation method thereof and application of compound in preparation of sEH inhibitor and PPARs agonist 沈阳药科大学 2024-06-18 CN disclosed
CN-118206542-A Compound, preparation method thereof and application of compound in preparation of sEH inhibitor and PPARs agonist 沈阳药科大学 2024-06-18 CN disclosed
CN-118184545-A Compound, preparation method thereof and application of compound in preparation of sEH inhibitor and PPARs agonist 沈阳药科大学 2024-06-14 CN disclosed
CN-116217511-B Double-target compound, preparation method thereof and application thereof in preparation of sEH inhibitor and PPARs agonist 沈阳药科大学 2024-04-19 CN disclosed
US-11820162-B2 Pretreatment liquid, ink set, base material for image recording, method of producing base material for image recording, image recording material, and image recording method FUJIFILM CORPORATION (JP) 2023-11-21 US disclosed
CN-116217511-A Double-target compound, preparation method thereof and application thereof in preparation of sEH inhibitor and PPARs agonist 沈阳药科大学 2023-06-06 CN disclosed
US-20100331440-A1 RADIATION-SENSITIVE COMPOSITION, POLYMER AND MONOMER JSR CORPORATION (JP) 2010-12-30 US disclosed
US-20100310988-A1 RESIST PATTERN-FORMING METHOD AND RESIST PATTERN MINIATURIZING RESIN COMPOSITION JSR CORPORATION (JP) 2010-12-09 US disclosed
US-20100310987-A1 POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND JSR CORPORATION (JP) 2010-12-09 US disclosed
US-20100203458-A1 METHOD FOR DEVELOPING A PRINTING PLATE PRECURSOR AGFA GRAPHICS NV (BE) 2010-08-12 US disclosed
US-20090269701-A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2009-10-29 US disclosed
US-20080138744-A1 Anti-Reflective Coating Forming Composition Containing Vinyl Ether Compound NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-06-12 US disclosed
US-7306891-B2 Recording layer containing a water-insoluble and alkali-soluble resin and an infrared absorbent, and an organic polymer layer with an arithmetic mean roughness Ra of 0.05 to 0.40 mu m on a face of the plate opposite to the recording layer; long-chain alkyl group-containing polymer matting agent FUJIFILM CORPORATION (JP) 2007-12-11 US disclosed
US-7279539-B2 Alkali-soluble polymer and polymerizable composition thereof FUJIFILM CORPORATION (JP) 2007-10-09 US disclosed
US-20070077518-A1 Recording layer containing a water-insoluble and alkali-soluble resin and an infrared absorbent, and an organic polymer layer with an arithmetic mean roughness Ra of 0.05 to 0.40 mu m on a face of the plate opposite to the recording layer; long-chain alkyl group-containing polymer matting agent FUJI PHOTO FILM CO., LTD. 2007-04-05 US disclosed
US-20070026344-A1 Infrared-sensitive planographic printing plate precursor FUJI PHOTO FILM CO., LTD. 2007-02-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100331440-A1 RADIATION-SENSITIVE COMPOSITION, POLYMER AND MONOMER ALG1, MRE11, PCNA CA1 3136/4885CA2 4590/4885CA7 2814/4885
US-20100310987-A1 POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND RAD1, FRG1, RAD51 CA1 779/4885CA2 3794/4885CA7 1082/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.