SCHEMBL10175873

SCHEMBL10175873

C=C(C)C(=C)OCC(=O)OCC(F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HTT P42858 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL800122 0.85 TSHR (0.41) HTT
SCHEMBL20103091 0.84 TSHR (0.40) HTT
SCHEMBL12396630 0.82 HTT (0.39) HTT
SCHEMBL22171042 0.75 TSHR (0.32)
SCHEMBL21074232 0.74 HTT (0.39) HTT
SCHEMBL28031899 0.74 TSHR (0.48) HTT
SCHEMBL9937439 0.74 HTT (0.46) HTT
SCHEMBL36595 0.74 TSHR (0.48) HTT
SCHEMBL16547498 0.73 HTT (0.42) HTT
SCHEMBL16547499 0.73 HTT (0.47) HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120077125-A1 RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2012-03-29 US disclosed