Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.52 |
| ▸ | NISCH | Q9Y2I1 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.33 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.33 |
| ▸ | PPARA | Q07869 | 1/20 | 0.33 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.33 |
| ▸ | RORC | P51449 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9571993 | 0.86 | TSHR (0.53) | TSHRNISCHKDM4EL3MBTL1ATM | |
| SCHEMBL28724166 | 0.83 | TSHR (0.50) | TSHRNISCHKDM4EL3MBTL1ATM | |
| SCHEMBL9968895 | 0.82 | GABRA1 (0.41) | TSHRNISCHL3MBTL1GABRA1GABRB2 | |
| SCHEMBL3627333 | 0.79 | TSHR (0.59) | TSHRNISCHKDM4EL3MBTL1ATM | |
| SCHEMBL9838740 | 0.79 | TSHR (0.59) | TSHRNISCHKDM4EL3MBTL1ATM | |
| SCHEMBL23489760 | 0.78 | PDK2 (0.36) | TSHRKDM4EATMHTTALDH1A1 | |
| SCHEMBL2889829 | 0.78 | PDK2 (0.36) | TSHRKDM4EATMHTTALDH1A1 | |
| SCHEMBL4606173 | 0.78 | CYP2D6 (0.38) | ALDH1A1PDK2 | |
| SCHEMBL5353085 | 0.78 | TSHR (0.57) | TSHRNISCHKDM4EL3MBTL1ATM | |
| SCHEMBL23488987 | 0.78 | TSHR (0.49) | TSHRKDM4EL3MBTL1ALDH1A1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124310-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20090087784-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |