SCHEMBL10178620

SCHEMBL10178620

CCC(C)c1cc(COC)cc(C(=O)OC)c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.48
LMNA P02545 4/20 0.46
L3MBTL1 Q9Y468 2/20 0.42
NPC1 O15118 1/20 0.42
HSP90AA1 P07900 1/20 0.42
RAB9A P51151 1/20 0.42
CA1 P00915 2/20 0.42
CA2 P00918 2/20 0.42
CA12 O43570 1/20 0.42
CA7 P43166 1/20 0.42
CA9 Q16790 1/20 0.42
CA14 Q9ULX7 1/20 0.42
KDM4E B2RXH2 4/20 0.40
SLC7A5 Q01650 2/20 0.39
ALDH1A1 P00352 3/20 0.38
STAT3 P40763 1/20 0.38
LOXL2 Q9Y4K0 1/20 0.38
POLB P06746 1/20 0.38
GAA P10253 1/20 0.38
NFKB1 P19838 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13144232 0.86 HSD17B10 (0.57) HSD17B10LMNAL3MBTL1NPC1HSP90AA1
SCHEMBL13898424 0.83 CA12 (0.59) HSD17B10LMNAL3MBTL1NPC1HSP90AA1
SCHEMBL4652561 0.81 CA12 (0.57) HSD17B10LMNAL3MBTL1CA1CA2
SCHEMBL20328819 0.80 HSD17B10 (0.51) HSD17B10LMNAL3MBTL1NPC1HSP90AA1
SCHEMBL9963707 0.78 HSD17B10 (0.52) HSD17B10LMNAL3MBTL1NPC1HSP90AA1
SCHEMBL4651610 0.74 CA12 (0.50) HSD17B10LMNAL3MBTL1CA1CA2
SCHEMBL16958759 0.74 HSD17B10 (0.44) HSD17B10LMNAL3MBTL1CA1CA2
SCHEMBL1787505 0.74 HDAC4 (0.51) LMNARAB9ACA1CA2CA12
SCHEMBL28346938 0.74 HDAC4 (0.51) LMNARAB9ACA1CA2CA12
SCHEMBL22946239 0.73 ALDH1A1 (0.49) HSD17B10LMNAL3MBTL1NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed