SCHEMBL10178754

SCHEMBL10178754

CCC(C)(C)c1ccc(CN(C)C)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HRH3 Q9Y5N1 3/20 0.52
ALDH1A1 P00352 2/20 0.46
TSHR P16473 2/20 0.46
TAAR1 Q96RJ0 2/20 0.45
NPC1 O15118 2/20 0.43
RAB9A P51151 2/20 0.43
MAPT P10636 1/20 0.43
LSS P48449 1/20 0.41
CYP1A2 P05177 1/20 0.40
CYP2C19 P33261 1/20 0.40
ESR1 P03372 2/20 0.39
ESR2 Q92731 2/20 0.39
KCNH2 Q12809 2/20 0.39
NOS3 P29474 1/20 0.39
NOS1 P29475 1/20 0.39
NOS2 P35228 1/20 0.39
RIPK1 Q13546 2/20 0.38
LMNA P02545 2/20 0.37
GAA P10253 1/20 0.37
ADORA3 P0DMS8 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1728531 0.80 HRH3 (0.58) HRH3ALDH1A1TSHRTAAR1LSS
SCHEMBL798094 0.80 HRH3 (0.58) HRH3ALDH1A1TSHRTAAR1RAB9A
SCHEMBL24022682 0.80 HRH3 (0.44) HRH3ALDH1A1TSHRTAAR1LSS
SCHEMBL779443 0.79 NPC1 (0.58) HRH3TAAR1NPC1RAB9AMAPT
SCHEMBL11320124 0.78 HRH3 (0.61) HRH3ALDH1A1TSHRTAAR1LSS
SCHEMBL11539224 0.78 NPC1 (0.48) HRH3ALDH1A1TAAR1NPC1RAB9A
SCHEMBL659509 0.76 HRH3 (0.82) HRH3ALDH1A1TSHRTAAR1NOS3
SCHEMBL15125623 0.75 HRH3 (0.71) HRH3ALDH1A1TSHRTAAR1CYP1A2
SCHEMBL13109190 0.74 HDAC8 (0.41) ALDH1A1NPC1RAB9AMAPTESR1
SCHEMBL13272036 0.74 SLC2A1 (0.52) ALDH1A1TSHRNPC1RAB9AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed