SCHEMBL10178800

SCHEMBL10178800

CCC(C)(C)C(=O)OC1C2CC3C1OC(=O)C3(C(=O)OC(C)OC1CCCCC1)C2

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ HMGCR P04035 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10293965 0.92 — —
SCHEMBL10179306 0.92 — —
SCHEMBL10178895 0.92 — —
SCHEMBL16706514 0.91 — —
SCHEMBL16591052 0.89 — —
SCHEMBL10178933 0.87 HMGCR (0.31) HMGCR
SCHEMBL16591078 0.87 HMGCR (0.33) HMGCR
SCHEMBL10178923 0.87 HMGCR (0.32) HMGCR
SCHEMBL16591022 0.85 HMGCR (0.30) HMGCR
SCHEMBL16746686 0.84 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8865389-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern FUJIFILM CORPORATION (JP) 2014-10-21 — — US disclosed
US-20120171618-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING A PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2012-07-05 — — US disclosed
US-20120076997-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2012-03-29 — — US disclosed
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