SCHEMBL16591022

SCHEMBL16591022

CCC(C)(C)C(=O)OC1C2CC3C1OC(=O)C3(C(=O)OCOC1CCCCC1)C2

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ HMGCR P04035 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16591103 0.88 HMGCR (0.32) HMGCR
SCHEMBL10178800 0.85 HMGCR (0.30) HMGCR
SCHEMBL2754976 0.84 HMGCR (0.34) HMGCR
SCHEMBL10178849 0.84 HMGCR (0.32) HMGCR
SCHEMBL18802867 0.84 HMGCR (0.34) HMGCR
SCHEMBL10179306 0.84 — —
SCHEMBL16706514 0.84 — —
SCHEMBL9973320 0.84 HMGCR (0.32) HMGCR
SCHEMBL18802895 0.83 HMGCR (0.34) HMGCR
SCHEMBL15681904 0.83 HMGCR (0.33) HMGCR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170121437-A1 PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND MASK BLANK FUJIFILM CORPORATION (JP) 2017-05-04 — — US disclosed
US-20160195814-A1 PATTERN FORMATION METHOD, ELECTRONIC-DEVICE PRODUCTION METHOD, AND PROCESSING AGENT FUJIFILM CORPORATION (JP) 2016-07-07 — — US disclosed
US-20150086912-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-03-26 — — US disclosed
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