SCHEMBL10180784

SCHEMBL10180784

CCC1(OC(=O)COC(=O)C2C3CC4C(OC(=O)C42)C3OC(=O)C(C)(C)CC)CCCC1

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HMGCR P04035 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12017773 0.91
SCHEMBL6367970 0.91 HMGCR (0.33) HMGCR
SCHEMBL12017774 0.91 ALDH1A1 (0.31)
SCHEMBL11964380 0.90 HMGCR (0.33) HMGCR
SCHEMBL120069 0.90
SCHEMBL13006371 0.89
SCHEMBL12650460 0.87
SCHEMBL12650459 0.86
SCHEMBL15746445 0.84
SCHEMBL25515045 0.84 ALDH1A1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8865389-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern FUJIFILM CORPORATION (JP) 2014-10-21 US disclosed
US-20120076997-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2012-03-29 US disclosed