Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | THRB | P10828 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Butane SCHEMBL4435590 | 1.00 | — | — | |
| Butane SCHEMBL28786322 | 1.00 | — | — | |
| Butane SCHEMBL7724220 | 1.00 | TSHR (0.44) | TSHRLMNATHRBALDH1A1SLC22A1 | |
| Butane SCHEMBL8454628 | 1.00 | TSHR (0.44) | TSHRLMNATHRBALDH1A1SLC22A1 | |
| Butane SCHEMBL1019190 | 1.00 | TSHR (0.44) | TSHRLMNATHRBALDH1A1SLC22A1 | |
| Butane SCHEMBL4387446 | 1.00 | TSHR (0.44) | TSHRLMNATHRBALDH1A1SLC22A1 | |
| Butane SCHEMBL7457770 | 1.00 | TSHR (0.44) | TSHRLMNATHRBALDH1A1SLC22A1 | |
| Butane SCHEMBL1003138 | 1.00 | TSHR (0.44) | TSHRLMNATHRBALDH1A1SLC22A1 | |
| Butane SCHEMBL11764235 | 1.00 | TSHR (0.44) | TSHRLMNATHRBALDH1A1SLC22A1 | |
| Butane SCHEMBL9811030 | 0.93 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6869732-B2 | Glass substrate for photomasks and preparation method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-22 | — | — | US | claimed |
| US-6855908-B2 | Glass substrate and leveling thereof | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-02-15 | — | — | US | claimed |
| CN-110002968-B | Method for preparing fluorine-containing ether | 泉州宇极新材料科技有限公司 | 2022-04-08 | — | — | CN | disclosed |
| US-9316902-B2 | Photomask-forming glass substrate and making method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-19 | — | — | US | disclosed |
| EP-2339399-B1 | Photomask-forming glass substrate and making method | SHINETSU CHEMICAL CO (JP) | 2016-02-17 | — | — | EP | disclosed |
| US-20140004309-A1 | PHOTOMASK-FORMING GLASS SUBSTRATE AND MAKING METHOD | SHIN-ETSI CHEMICAL CO., LTD. (JP) | 2014-01-02 | — | — | US | disclosed |
| US-8551346-B2 | Photomask-forming glass substrate and making method | SHIN-ETSU CHEMCIAL CO., LTD. (JP) | 2013-10-08 | — | — | US | disclosed |
| EP-2339399-A2 | Photomask-forming glass substrate and making method | Shin-Etsu Chemical Co., Ltd. (JP) | 2011-06-29 | — | — | EP | disclosed |
| US-20110143267-A1 | PHOTOMASK-FORMING GLASS SUBSTRATE AND MAKING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-06-16 | — | — | US | disclosed |
| EP-1253117-B1 | Glass substrate for photomasks and preparation method | SHINETSU CHEMICAL CO (JP) | 2011-01-12 | — | — | EP | disclosed |
| US-6869732-B2 | Glass substrate for photomasks and preparation method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-22 | — | — | US | disclosed |
| US-6855908-B2 | Glass substrate and leveling thereof | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-02-15 | — | — | US | disclosed |
| US-20020179576-A1 | Glass substrate and leveling thereof | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-12-05 | — | — | US | disclosed |
| EP-1253117-A1 | Glass substrate for photomasks and preparation method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-10-30 | — | — | EP | disclosed |
| US-20020155361-A1 | Glass substrate for photomasks and preparation method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-10-24 | — | — | US | disclosed |
| EP-1251108-A1 | Glass substrate and leveling thereof | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-10-23 | — | — | EP | disclosed |