Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | THRB | P10828 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Butane SCHEMBL4435590 | 1.00 | — | — | |
| Butane SCHEMBL28786322 | 1.00 | — | — | |
| Butane SCHEMBL7724220 | 1.00 | TSHR (0.44) | TSHRLMNATHRBALDH1A1SLC22A1 | |
| Butane SCHEMBL8454628 | 1.00 | TSHR (0.44) | TSHRLMNATHRBALDH1A1SLC22A1 | |
| Butane SCHEMBL1019190 | 1.00 | TSHR (0.44) | TSHRLMNATHRBALDH1A1SLC22A1 | |
| Butane SCHEMBL7457770 | 1.00 | TSHR (0.44) | TSHRLMNATHRBALDH1A1SLC22A1 | |
| Butane SCHEMBL1003138 | 1.00 | TSHR (0.44) | TSHRLMNATHRBALDH1A1SLC22A1 | |
| Butane SCHEMBL1019191 | 1.00 | TSHR (0.44) | TSHRLMNATHRBALDH1A1SLC22A1 | |
| Butane SCHEMBL11764235 | 1.00 | TSHR (0.44) | TSHRLMNATHRBALDH1A1SLC22A1 | |
| Butane SCHEMBL9811030 | 0.93 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12248249-B2 | Resist material and pattern forming method | Oji Holdings Corporation (JP) | 2025-03-11 | — | — | US | disclosed |
| US-20250004376-A1 | RESIST MATERIAL AND PATTERN FORMING METHOD | Oji Holdings Corporation (JP) | 2025-01-02 | — | — | US | disclosed |
| US-20220373886-A1 | RESIST MATERIAL AND PATTERN FORMING METHOD | Oji Holdings Corporation (JP) | 2022-11-24 | — | — | US | disclosed |
| WO-2021002350-A1 | RESIST MATERIAL AND METHOD FOR FORMING PATTERN | 王子ホールディングス株式会社 | 2021-01-07 | — | — | WO | disclosed |
| US-9312181-B2 | Semiconductor device, electronic device including the same and manufacturing methods thereof | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2016-04-12 | — | — | US | disclosed |
| US-20150162247-A1 | SEMICONDUCTOR DEVICE, ELECTRONIC DEVICE INCLUDING THE SAME AND MANUFACTURING METHODS THEREOF | SAMSUNG ELECTRONICS CO., LTD (KR) | 2015-06-11 | — | — | US | disclosed |
| US-7628866-B2 | Method of cleaning wafer after etching process | UNITED MICROELECTRONICS CORP. (TW) | 2009-12-08 | — | — | US | disclosed |
| US-20080121619-A1 | METHOD OF CLEANING WAFER AFTER ETCHING PROCESS | UNITED MICROELECTRONICS CORP. (TW) | 2008-05-29 | — | — | US | disclosed |
| US-20040013386-A1 | Optical device and method of manufacture thereof | AGERE SYSTEMS, INC. | 2004-01-22 | — | — | US | disclosed |
| JP-2002361041-A | METHOD FOR PRETREATING FOR RECOVERING PFC MIXED WASTE GAS | RESEARCH INSTITUTE OF INNOVATIVE TECHNOLOGY FOR THE EARTH | 2002-12-17 | — | — | JP | disclosed |