⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12357797 | 0.89 | — | — | |
| SCHEMBL10235395 | 0.89 | — | — | |
| SCHEMBL10170770 | 0.87 | OGA (0.30) | — | |
| SCHEMBL10239382 | 0.81 | — | — | |
| SCHEMBL16938898 | 0.78 | — | — | |
| SCHEMBL10239369 | 0.78 | — | — | |
| SCHEMBL10234121 | 0.77 | — | — | |
| SCHEMBL17012524 | 0.75 | — | — | |
| SCHEMBL14553497 | 0.75 | LMNA (0.32) | — | |
| SCHEMBL12326725 | 0.75 | LMNA (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2356516-B1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORP (JP) | 2017-10-25 | — | — | EP | disclosed |
| US-9650451-B2 | Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-05-16 | — | — | US | disclosed |
| US-8791288-B2 | Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-29 | — | — | US | disclosed |
| US-8791288-B2 | Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-29 | — | — | US | disclosed |
| US-20140171584-A1 | Fluorine-Containing Compounds and Their Polymers Useful for Anti-Reflection Film Materials and Resist Compositions | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-06-19 | — | — | US | disclosed |
| WO-2012086850-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-06-28 | — | — | WO | disclosed |
| US-20120077126-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-03-29 | — | — | US | disclosed |
| US-20110196121-A1 | Fluorine-Containing Compounds and their Polymers Useful for Anti-Reflection Film Materials and Resist Compositions | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-08-11 | — | — | US | disclosed |
| US-7947422-B2 | Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-05-24 | — | — | US | disclosed |
| US-7947422-B2 | Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-05-24 | — | — | US | disclosed |
| US-7887990-B2 | Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-02-15 | — | — | US | disclosed |
| US-20100304295-A1 | ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20100304295-A1 | ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20090272295-A1 | Coating Materials Consisting of Low- or Medium-Molecular Organic Compounds | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-11-05 | — | — | US | disclosed |
| US-20090272295-A1 | Coating Materials Consisting of Low- or Medium-Molecular Organic Compounds | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-11-05 | — | — | US | disclosed |
| US-7488567-B2 | Polymer, resist composition and patterning process | PANASONIC CORPORATION (JP) | 2009-02-10 | — | — | US | disclosed |
| EP-2009499-A1 | MATERIAL OF THE RESIST-PROTECTING MEMBRANE FOR IMMERSION LITHOGRAPHY | Asahi Glass Company, Limited (JP) | 2008-12-31 | — | — | EP | disclosed |
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-12-18 | — | — | US | disclosed |
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-12-18 | — | — | US | disclosed |
| EP-1811339-A1 | Pattern forming method | Fujifilm Corporation (JP) | 2007-07-25 | — | — | EP | disclosed |