SCHEMBL1022669

SCHEMBL1022669

CCCCCc1ccc2c3ccccc3c3ccccc3c2c1CCCCC

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LIPG Q9Y5X9 1/20 0.43
TYR P14679 2/20 0.41
KDM4E B2RXH2 3/20 0.41
ALDH1A1 P00352 3/20 0.41
HPGD P15428 3/20 0.41
HSD17B10 Q99714 3/20 0.41
GAA P10253 2/20 0.41
TLR8 Q9NR97 5/20 0.40
MAPT P10636 3/20 0.39
CYP3A4 P08684 2/20 0.39
MEN1 O00255 1/20 0.39
TP53 P04637 1/20 0.39
ALOX5 P09917 1/20 0.39
ALOX15 P16050 1/20 0.39
TSHR P16473 1/20 0.39
HTT P42858 1/20 0.39
KMT2A Q03164 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
USP2 O75604 1/20 0.38
GLA P06280 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28397789 0.92 LIPG (0.40) LIPGTYRKDM4EALDH1A1HPGD
SCHEMBL1022618 0.81 HPRT1 (0.45) LIPGTYRKDM4EALDH1A1HPGD
SCHEMBL27509090 0.80 TYR (0.44) LIPGTYRKDM4EALDH1A1HPGD
SCHEMBL20943647 0.80 TYR (0.44) LIPGTYRKDM4EALDH1A1HPGD
SCHEMBL27490936 0.80 TYR (0.44) LIPGTYRKDM4EALDH1A1HPGD
SCHEMBL28741087 0.80 TYR (0.44) LIPGTYRKDM4EALDH1A1HPGD
SCHEMBL28884838 0.80 TYR (0.42) LIPGTYRKDM4EALDH1A1HPGD
SCHEMBL170762 0.79 LIPG (0.52) LIPGTLR8ALOX5
SCHEMBL28686355 0.79 ESR1 (0.39) LIPGTYRKDM4EALDH1A1HPGD
SCHEMBL6919402 0.79 NCEH1 (0.47) LIPGTYRKDM4EALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1739485-B1 RESIST COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2016-08-31 EP disclosed
US-7871751-B2 Resist composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2011-01-18 US disclosed
US-20080153031-A1 Resist composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-06-26 US disclosed
EP-1739485-A1 RESIST COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-01-03 EP disclosed