Bicarbonate

Bicarbonate

SCHEMBL1022672

C=C.C=C.O=C(O)O.O=C(O)O

nearest known ligand 0.71

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

GSK3AGSK3BIMPA1

The experimentally established mechanism targets of Bicarbonate. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.71
CA2 P00918 1/20 0.71
CA9 Q16790 1/20 0.71
LMNA P02545 2/20 0.42
FFAR3 O14843 2/20 0.40
ACHE P22303 1/20 0.40
LCK P06239 1/20 0.40
FYN P06241 1/20 0.40
TSHR P16473 5/20 0.33
LDHA P00338 2/20 0.33
EGLN1 Q9GZT9 2/20 0.33
LDHB P07195 1/20 0.33
SRR Q9GZT4 1/20 0.33
TP53 P04637 1/20 0.33
ALKBH5 Q6P6C2 1/20 0.33
SUCNR1 Q9BXA5 1/20 0.33
EGLN3 Q9H6Z9 1/20 0.33
GLRA1 P23415 1/20 0.31
SLC6A9 P48067 1/20 0.31
OR51E2 Q9H255 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bicarbonate SCHEMBL177966 1.00 CA1 (0.71) CA1CA2CA9LMNAFFAR3
Bicarbonate SCHEMBL6065486 1.00 CA1 (0.71) CA1CA2CA9LMNAFFAR3
Bicarbonate SCHEMBL4649251 1.00 CA1 (0.71) CA1CA2CA9LMNAFFAR3
Bicarbonate SCHEMBL20650 1.00
Bicarbonate SCHEMBL3974066 1.00 CA1 (0.71) CA1CA2CA9LMNAFFAR3
Bicarbonate SCHEMBL10831385 1.00 CA1 (0.71) CA1CA2CA9LMNAFFAR3
Bicarbonate SCHEMBL166967 1.00
Bicarbonate SCHEMBL968687 1.00 CA1 (0.71) CA1CA2CA9LMNAFFAR3
Bicarbonate SCHEMBL23802372 0.94
Bicarbonate SCHEMBL1801942 0.94 CA1 (0.62) CA1CA2CA9LMNAFFAR3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117402362-A Synthesis method of polymer containing selenoether group, product thereof and degradation method 浙江大学 2024-01-16 CN claimed
CN-117402362-A Synthesis method of polymer containing selenoether group, product thereof and degradation method 浙江大学 2024-01-16 CN disclosed
WO-2023127375-A1 COATING MATERIAL FOR SECONDARY BATTERY SEPARATOR AND METHOD FOR MANUFACTURING SAME, SECONDARY BATTERY SEPARATOR, AND SECONDARY BATTERY 信越化学工業株式会社 2023-07-06 WO disclosed
CN-110483808-A A kind of method of quick dissolution sodium carboxymethylcellulose WUHU ETC BATTERY LTD 2019-11-22 CN disclosed
CN-107915706-A A kind of preparation method of fluorinated ethylene carbonate 庆阳凯威尔能源化工有限公司 2018-04-17 CN disclosed
US-8642718-B2 Curable composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-02-04 US disclosed
EP-1882713-B1 CURABLE COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2013-07-03 EP disclosed
US-8394920-B2 Composition for resin and optical lens obtained therefrom MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-03-12 US disclosed
CN-101932630-B Composition for resin and optical lens obtained therefrom MITSUBISHI GAS CHEMICAL CO 2012-12-05 CN disclosed
US-8159815-B2 Electrochemical capacitor DAIHATSU MOTOR CO., LTD. (JP) 2012-04-17 US disclosed
US-7009031-B2 Composition for optical material MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2006-03-07 US disclosed
US-20050154073-A1 Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof ISHII KENJI (JP) 2005-07-14 US disclosed
EP-1524289-A1 POLYMERIZABLE COMPOSITION, OPTICAL MATERIAL COMPRISING THE COMPOSITION AND METHOD FOR PRODUCING THE MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2005-04-20 EP disclosed
US-6872333-B2 Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof MITSUBISHI GAS CHEMICAL COMPANY, LTD. (JP) 2005-03-29 US disclosed
US-20040254258-A1 Polymerizable composition, optical material comprising the composition and method for producing the material MITSUBISHI GAS CHEMICAL CO., LTD. (JP) 2004-12-16 US disclosed
US-20040158031-A1 Alicyclic compound for optical material MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2004-08-12 US disclosed
EP-1398317-A1 ALICYCLIC COMPOUND FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-03-17 EP disclosed
US-20040024165-A1 Composition for optical material MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2004-02-05 US disclosed
US-20030195270-A1 Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof ISHII KENJI (JP) 2003-10-16 US disclosed
EP-1319966-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-06-18 EP disclosed