Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 6/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.44 |
| ▸ | TP53 | P04637 | 3/20 | 0.44 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.44 |
| ▸ | THRB | P10828 | 3/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | THRA | P10827 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7771186 | 0.96 | TSHR (0.53) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL21123398 | 0.94 | TSHR (0.47) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL21123488 | 0.91 | TSHR (0.47) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL8997479 | 0.89 | TSHR (0.44) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL3875558 | 0.87 | TSHR (0.57) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL22230397 | 0.84 | ATM (0.32) | — | |
| SCHEMBL13879032 | 0.82 | TSHR (0.68) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL7771188 | 0.81 | TSHR (0.38) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL14776486 | 0.80 | TSHR (0.53) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL9696933 | 0.80 | MEN1 (0.42) | TSHRALDH1A1TP53HIF1ATHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2799455-B1 | Resin composition for optical member and optical member obtained from the same | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-03-28 | — | — | EP | disclosed |
| US-9399693-B2 | Resin composition for photoimprinting, pattern forming process and etching mask | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2016-07-26 | — | — | US | disclosed |
| US-9399693-B2 | Resin composition for photoimprinting, pattern forming process and etching mask | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2016-07-26 | — | — | US | disclosed |
| US-20160208127-A1 | COMPOSITION AND FILM | TOYO GOSEI CO., LTD. (JP) | 2016-07-21 | — | — | US | disclosed |
| EP-2463318-B1 | Resin composition for optical member and optical member obtained from the same | MITSUBISHI GAS CHEMICAL CO (JP) | 2015-01-14 | — | — | EP | disclosed |
| EP-2799455-A2 | Resin composition for optical member and optical member obtained from the same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-11-05 | — | — | EP | disclosed |
| US-8642718-B2 | Curable composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-02-04 | — | — | US | disclosed |
| US-20130288021-A1 | RESIN COMPOSITION FOR PHOTOIMPRINTING, PATTERN FORMING PROCESS AND ETCHING MASK | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2013-10-31 | — | — | US | disclosed |
| US-20130288021-A1 | RESIN COMPOSITION FOR PHOTOIMPRINTING, PATTERN FORMING PROCESS AND ETCHING MASK | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2013-10-31 | — | — | US | disclosed |
| EP-1882713-B1 | CURABLE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2013-07-03 | — | — | EP | disclosed |
| US-7009031-B2 | Composition for optical material | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2006-03-07 | — | — | US | disclosed |
| US-20050154073-A1 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | ISHII KENJI (JP) | 2005-07-14 | — | — | US | disclosed |
| EP-1524289-A1 | POLYMERIZABLE COMPOSITION, OPTICAL MATERIAL COMPRISING THE COMPOSITION AND METHOD FOR PRODUCING THE MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2005-04-20 | — | — | EP | disclosed |
| US-6872333-B2 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | MITSUBISHI GAS CHEMICAL COMPANY, LTD. (JP) | 2005-03-29 | — | — | US | disclosed |
| US-20040254258-A1 | Polymerizable composition, optical material comprising the composition and method for producing the material | MITSUBISHI GAS CHEMICAL CO., LTD. (JP) | 2004-12-16 | — | — | US | disclosed |
| US-20040158031-A1 | Alicyclic compound for optical material | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2004-08-12 | — | — | US | disclosed |
| EP-1398317-A1 | ALICYCLIC COMPOUND FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-03-17 | — | — | EP | disclosed |
| US-20040024165-A1 | Composition for optical material | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2004-02-05 | — | — | US | disclosed |
| US-20030195270-A1 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | ISHII KENJI (JP) | 2003-10-16 | — | — | US | disclosed |
| EP-1319966-A1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2003-06-18 | — | — | EP | disclosed |