SCHEMBL9696933

SCHEMBL9696933

C=CC(=O)OCC(O)COC1CCC(C(C)(C)C2CCC(OCC(O)COC(=O)C=C)CC2)CC1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 5/20 0.42
KMT2A Q03164 5/20 0.42
HTT P42858 2/20 0.42
TSHR P16473 7/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
NPSR1 Q6W5P4 1/20 0.40
SMN1; SMN2 Q16637 3/20 0.38
MAPT P10636 2/20 0.35
CYP2D6 P10635 1/20 0.35
LMNA P02545 1/20 0.34
GAA P10253 1/20 0.34
ALDH1A1 P00352 4/20 0.32
ADRB2 P07550 1/20 0.32
ADRB1 P08588 1/20 0.32
ADRB3 P13945 1/20 0.32
PRMT5 O14744 1/20 0.31
WDR77 Q9BQA1 1/20 0.31
THRA P10827 1/20 0.31
THRB P10828 1/20 0.31
TP53 P04637 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22111719 0.95 MEN1 (0.39) MEN1KMT2AHTTTSHRL3MBTL1
SCHEMBL10439388 0.85 TSHR (0.41) MEN1KMT2AHTTTSHRL3MBTL1
SCHEMBL4074514 0.81 TSHR (0.43) HTTTSHRNPSR1SMN1; SMN2MAPT
SCHEMBL1023798 0.80 TSHR (0.44) TSHRSMN1; SMN2ALDH1A1THRATHRB
SCHEMBL12134363 0.78 MEN1 (0.51) MEN1KMT2AHTTTSHRL3MBTL1
SCHEMBL7771186 0.77 TSHR (0.53) TSHRSMN1; SMN2ALDH1A1THRATHRB
SCHEMBL7771181 0.76 HTT (0.33) MEN1KMT2AHTTTSHRL3MBTL1
SCHEMBL21123398 0.76 TSHR (0.47) TSHRSMN1; SMN2ALDH1A1THRATHRB
SCHEMBL8997479 0.76 TSHR (0.44) TSHRSMN1; SMN2ALDH1A1THRATHRB
SCHEMBL13515564 0.75 TSHR (0.39) MEN1KMT2AHTTTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 74 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11186099-B2 Inkjet printing method and apparatus HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2021-11-30 US disclosed
US-20210309873-A1 TEXTILE PRINTING HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2021-10-07 US disclosed
US-20210309874-A1 TEXTILE PRINTING HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2021-10-07 US disclosed
US-11001073-B2 UV-curable inkjet inks HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2021-05-11 US disclosed
EP-2118169-B2 CURABLE COMPOSITION 3D SYSTEMS INC (US) 2021-03-17 EP disclosed
US-10920074-B2 Reactive polyurethane dispersions HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2021-02-16 US disclosed
US-10907057-B2 Reactive polyurethane dispersions HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2021-02-02 US disclosed
US-10857825-B2 Inkjet printing HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2020-12-08 US disclosed
US-10821760-B2 Inkjet printing HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2020-11-03 US disclosed
US-10723897-B2 Inkjet compositions HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2020-07-28 US disclosed
EP-1572814-B1 UV-CURABLE EPOXY ACRYLATES HUNTSMAN ADV MAT SWITZERLAND (CH) 2010-01-27 EP disclosed
US-20090191373-A1 Single Layer Film and Hydrophilic Material Comprising the Same MITSUI CHEMICALS ,INC. 2009-07-30 US disclosed
US-20090191373-A1 Single Layer Film and Hydrophilic Material Comprising the Same MITSUI CHEMICALS ,INC. 2009-07-30 US disclosed
WO-2008127930-A1 DUAL PHOTOINITIATOR, PHOTOCURABLE COMPOSITION, USE THEREOF AND PROCESS FOR PRODUCING A THREE DIMENSIONAL ARTICLE HUNTSMAN ADVANCED MATERIALS AMERICAS INC. 2008-10-23 WO disclosed
WO-2008110512-A1 PHOTOCURABLE COMPOSITIONS FOR PREPARING ABS-LIKE ARTICLES HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH (CH) 2008-09-18 WO disclosed
WO-2008110564-A1 CURABLE COMPOSITION HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH (CH) 2008-09-18 WO disclosed
EP-1955782-A1 SINGLE LAYER FILM AND HYDROPHILIC MATERIAL COMPOSED OF SAME Mitsui Chemicals, Inc. (JP) 2008-08-13 EP disclosed
US-20070007698-A1 Method of producting three-dimensional model FUJIFILM CORPORATION (JP) 2007-01-11 US disclosed
US-20070007698-A1 Method of producting three-dimensional model FUJIFILM CORPORATION (JP) 2007-01-11 US disclosed
US-5109097-A Polyethylenically-unsaturated polyurethane, polyurea and poythiourethane polymers; solvent, wear resistant coatings MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1992-04-28 US disclosed