SCHEMBL1024210

SCHEMBL1024210

C1=CC2(C=C1)CCCCC2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5836868 0.96
SCHEMBL31402449 0.85
SCHEMBL6536131 0.81
SCHEMBL726128 0.81
SCHEMBL19460536 0.72
SCHEMBL23740149 0.63
SCHEMBL2775347 0.63 POLB (0.39)
SCHEMBL11068637 0.62
SCHEMBL12226143 0.62
SCHEMBL14917380 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240425974-A1 DEPOSITION OF RUTHENIUM-CONTAINING FILMS BY NON-AROMATIZABLE CYCLIC-DIENE RUTHENIUM(0) COMPLEXES LAIR LIQUIDE SA POUR IEXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2024-12-26 US disclosed
WO-2024259111-A1 DEPOSITION OF RUTHENIUM-CONTAINING FILMS BY NON-AROMATIZABLE CYCLIC-DIENE RUTHENIUM(0) COMPLEXES L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2024-12-19 WO disclosed
EP-1176467-B1 Negative working photosensitive lithographic printing plate FUJIFILM CORP (JP) 2015-09-16 EP disclosed
US-20130216794-A1 INKJET INK COMPOSITION, IMAGE FORMING METHOD, AND PRINTED ARTICLE FUJIFILM CORPORATION (JP) 2013-08-22 US disclosed
EP-2628776-A1 Inkjet ink composition, image forming method, and printed article Fujifilm Corporation (JP) 2013-08-21 EP disclosed
EP-1204000-B1 Photosensitive lithographic printing plate FUJIFILM CORP (JP) 2011-01-12 EP disclosed
EP-1627734-B1 Planographic printing plate precursor FUJIFILM CORP (JP) 2008-10-15 EP disclosed
EP-1736826-B1 Photosensitive lithographic printing plate FUJIFILM CORP (JP) 2008-03-26 EP disclosed
EP-1834767-A2 Planographic printing plate precursor FUJIFILM Corporation (JP) 2007-09-19 EP disclosed
EP-1736826-A1 Photosensitive lithographic printing plate Fuji Photo Film Co., Ltd. (JP) 2006-12-27 EP disclosed
EP-1627734-A2 Planographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2006-02-22 EP disclosed
US-20050142485-A1 Image recording material FUJI PHOTO FILM CO., LTD. 2005-06-30 US disclosed
US-6861200-B2 Suitable for image-drawing with a laser light; (meth)acrylic acid ester imparts alkali developability to binder FUJI PHOTO FILM CO., LTD. (JP) 2005-03-01 US disclosed
EP-1195646-B1 Photosensitive lithographic printing plate precursor FUJI PHOTO FILM CO LTD (JP) 2005-02-09 EP disclosed
US-6777155-B2 PHOTOSENSITIVE LAYER INCLUDES A POLYURETHANE RESIN BINDER COMPRISING AN ALIPHATIC CYCLIC STRUCTURE WHICH HAS A CARBOXYL GROUP AS A SUBSTITUENT FUJI PHOTO FILM CO., LTD. (JP) 2004-08-17 US disclosed
US-20020136987-A1 Photosensitive layer includes a polyurethane resin binder comprising an aliphatic cyclic structure which has a carboxyl group as a substituent FUJIFILM CORPORATION (JP) 2002-09-26 US disclosed
EP-1204000-A1 Photosensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2002-05-08 EP disclosed
US-20020048725-A1 Suitable for image-drawing with a laser light; (meth)acrylic acid ester imparts alkali developability to binder FUJIFILM CORPORATION (JP) 2002-04-25 US disclosed
EP-1195646-A1 Photosensitive lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2002-04-10 EP disclosed
EP-1176467-A1 Negative working photosensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2002-01-30 EP disclosed