Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | TSHR | P16473 | 3/20 | 0.42 |
| ▸ | THRB | P10828 | 1/20 | 0.40 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | MGAM | O43451 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | SI | P14410 | 1/20 | 0.32 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | ZDHHC7 | Q9NXF8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10204588 | 0.85 | ALDH1A1 (0.46) | ALDH1A1TSHRTHRBSMN1; SMN2 | |
| SCHEMBL721450 | 0.81 | ALDH1A1 (0.43) | ALDH1A1TSHRTHRBSMN1; SMN2 | |
| SCHEMBL13559180 | 0.81 | ALDH1A1 (0.43) | ALDH1A1TSHRTHRBMGAMGAA | |
| SCHEMBL5935073 | 0.81 | TSHR (0.49) | ALDH1A1TSHRTHRBCA1CA2 | |
| SCHEMBL28142283 | 0.81 | GAA (0.44) | ALDH1A1TSHRTHRBMGAMGAA | |
| SCHEMBL4642191 | 0.80 | TSHR (0.41) | ALDH1A1TSHRTHRBSMN1; SMN2 | |
| SCHEMBL7395531 | 0.79 | CA1 (0.41) | ALDH1A1TSHRCA1CA2MGAM | |
| SCHEMBL27527491 | 0.79 | ALDH1A1 (0.40) | ALDH1A1TSHRTHRBMGAMGAA | |
| SCHEMBL15868619 | 0.79 | TSHR (0.54) | ALDH1A1TSHRTHRBCA1CA2 | |
| SCHEMBL3987348 | 0.78 | TSHR (0.39) | ALDH1A1TSHRTHRBCA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2450746-A1 | Positive resist composition and pattern forming method using the composition | Fujifilm Corporation (JP) | 2012-05-09 | — | — | EP | disclosed |