Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.48 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | SLC18A3 | Q16572 | 1/20 | 0.30 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.30 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.30 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16766681 | 1.00 | ALDH1A1 (0.48) | ALDH1A1L3MBTL1HSD11B1HSD17B10MAPT | |
| SCHEMBL16765705 | 0.98 | ALDH1A1 (0.47) | ALDH1A1L3MBTL1HSD11B1HSD17B10MAPT | |
| SCHEMBL11151810 | 0.93 | ALDH1A1 (0.47) | ALDH1A1L3MBTL1HSD11B1HSD17B10MAPT | |
| SCHEMBL12219336 | 0.81 | — | — | |
| SCHEMBL23308952 | 0.75 | ALDH1A1 (0.35) | ALDH1A1L3MBTL1HSD11B1HSD17B10 | |
| SCHEMBL14837179 | 0.75 | HSD17B10 (0.38) | ALDH1A1L3MBTL1HSD11B1HSD17B10MAPT | |
| SCHEMBL670072 | 0.75 | HSD17B10 (0.38) | ALDH1A1L3MBTL1HSD11B1HSD17B10MAPT | |
| SCHEMBL1237248 | 0.75 | ALDH1A1 (0.35) | ALDH1A1L3MBTL1HSD11B1HSD17B10 | |
| SCHEMBL28655951 | 0.75 | ALDH1A1 (0.35) | ALDH1A1L3MBTL1HSD11B1HSD17B10 | |
| SCHEMBL4452440 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2413191-A1 | Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith | Fujifilm Corporation (JP) | 2012-02-01 | — | — | EP | disclosed |
| US-7700256-B2 | Phenolic/alicyclic copolymers and photoresists | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-04-20 | — | — | US | disclosed |
| US-7700256-B2 | Phenolic/alicyclic copolymers and photoresists | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-04-20 | — | — | US | disclosed |
| US-20080220597-A1 | Photoresists and methods for use thereof | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-09-11 | — | — | US | disclosed |
| US-20080220597-A1 | Photoresists and methods for use thereof | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-09-11 | — | — | US | disclosed |
| US-7297616-B2 | Methods, photoresists and substrates for ion-implant lithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-11-20 | — | — | US | disclosed |
| US-7297616-B2 | Methods, photoresists and substrates for ion-implant lithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-11-20 | — | — | US | disclosed |