SCHEMBL1024951

SCHEMBL1024951

CCCOCC1CS1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21409490 0.84 ALDH1A1 (0.52)
SCHEMBL1402632 0.84 TSHR (0.31)
SCHEMBL2784940 0.82 ALDH1A1 (0.55)
SCHEMBL4645306 0.81
SCHEMBL4646300 0.81
SCHEMBL1402726 0.79 TSHR (0.44)
SCHEMBL1402483 0.79 TSHR (0.39)
SCHEMBL2734304 0.79 USP2 (0.31)
SCHEMBL1402413 0.77 TSHR (0.42)
SCHEMBL28415778 0.76 MEN1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6201061-B1 CURING A RESIN FOR OPTICAL USE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-03-13 US claimed
US-6197226-B1 COMPRISING DIPPING RESIN INTO A LIQUID CONTAINING POLAR COMPOUND SELECTED FROM POLAR INORGANIC COMPOUNDS AND POLAR ORGANIC COMPOUNDS AND TINTING RESIN, WHEREIN RESIN IS OBTAINED BY CURING BY POLYMERIZATION A SULFUR CONTAINING COMPOUND MITSUBISHI GAS CHEMICAL COMPANY (JP) 2001-03-06 US claimed
CN-111868099-B Method for setting polymerization conditions and method for producing optical material 三井化学株式会社 2022-12-16 CN disclosed
CN-107428040-B Method for manufacturing plastic lens, method for positioning film, and composite body 株式会社HOPNIC研究所 2022-05-31 CN disclosed
CN-112469768-A Method for setting polymerization conditions and method for producing optical material 三井化学株式会社 2021-03-09 CN disclosed
CN-111868099-A Method for setting polymerization conditions and method for producing optical material 三井化学株式会社 2020-10-30 CN disclosed
CN-104903754-B Optical material, composition for optical material, and use thereof 三井化学株式会社 2020-05-22 CN disclosed
WO-2020022369-A1 METHOD FOR SETTING POLYMERIZATION CONDITIONS AND METHOD FOR PRODUCING OPTICAL MATERIAL 三井化学株式会社 2020-01-30 WO disclosed
WO-2019187176-A1 METHOD FOR SETTING POLYMERIZATION CONDITIONS AND METHOD FOR PRODUCING OPTICAL MATERIAL 三井化学株式会社 2019-10-03 WO disclosed
US-9341948-B2 Photopatternable materials and related electronic devices and methods POLYERA CORPORATION (US) 2016-05-17 US disclosed
US-20150056553-A1 Photopatternable Materials and Related Electronic Devices and Methods USINVEST LLC 2015-02-26 US disclosed
EP-0980696-A1 Process for treating a compound having epithio structures for disposal MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-02-23 EP disclosed
EP-0978513-A1 Ether compound and cured resin using the same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-02-09 EP disclosed
EP-0950905-A2 Process for producing a novel resin for optical materials having excellent color tone and transparency MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1999-10-20 EP disclosed
US-5945504-A Episulfide compound MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1999-08-31 US disclosed
EP-0936233-A2 Composition for a resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1999-08-18 EP disclosed
EP-0928802-A2 Process for tinting a resin having a large refractivity index and optical material tinted by the process MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1999-07-14 EP disclosed
EP-0921417-A2 Epoxy/episulfide resin compositions for optical materials MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1999-06-09 EP disclosed
EP-0874016-A2 Novel resin for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1998-10-28 EP disclosed
EP-0785194-A1 Episulfide compound MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1997-07-23 EP disclosed