SCHEMBL1025633

SCHEMBL1025633

C(SCC(CSCC1CS1)[Se]C(CSCC1CS1)CSCC1CS1)C1CS1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14093974 0.77
SCHEMBL1275536 0.73
SCHEMBL19244087 0.71
SCHEMBL1026790 0.70
SCHEMBL1024604 0.69
SCHEMBL1402528 0.68
SCHEMBL1402638 0.67
SCHEMBL6846309 0.67
SCHEMBL1402801 0.67
SCHEMBL16950094 0.67 LMNA (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1398317-B1 ALICYCLIC COMPOUND FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2011-01-12 EP disclosed
EP-1319966-B1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2010-05-26 EP disclosed
EP-1426392-B1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2010-02-24 EP disclosed
EP-1378535-B1 POLYMERIZATION REGULATORS AND COMPOSITIONS FOR RESIN MITSUBISHI GAS CHEMICAL CO (JP) 2009-11-11 EP disclosed
US-7446163-B2 Polymerization regulator and composition for resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-11-04 US disclosed
US-7301705-B2 Alicyclic compound for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-11-27 US disclosed
US-20070149639-A1 Polymerizable composition, optical material comprising the composition and method for producing the material HORIKOSHI HIROSHI 2007-06-28 US disclosed
US-7169845-B2 Polymerization regulators and compositions for resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-01-30 US disclosed
EP-0896972-B1 METHOD FOR PRODUCING A SELENIZED TRANSPARENT OPTICAL MATERIAL MITSUI CHEMICALS INC (JP) 2006-11-29 EP disclosed
US-7091307-B2 Composition for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2006-08-15 US disclosed
US-6482918-B2 HIGH REFRACTIVE INDEX, LOW DISPERSION AND EXCELLENT OPTICAL PROPERTY, AND IS USED FOR A GLASSES LENS, CAMERA LENS, PRISM, SUBSTRATE FOR AN INFORMATION RECORDING MEDIUM, PICK UP LENS, OPTICAL FIBER, OPTICAL FILTER MITSUI CHEMICALS, INC. (JP) 2002-11-19 US disclosed
US-6472495-B1 RESIN PRODUCED BY CURING THE COMPOSITION BY POLYMERIZATION HAS AN EXCELLENT IMPACT RESISTANCE AND OPTICAL PROPERTIES, AND IS SUITABLE AS AN OPTICAL MATERIAL. POLYMERS WITH SULFIDE, SELINIUM AND TELLURIUM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2002-10-29 US disclosed
US-6444146-B2 DISCOLORATION INHIBITION MITSUBISHI GAS CHEMICAL CO. (JP) 2002-09-03 US disclosed
US-20020120097-A1 Selenium-containing transparent optical material OKAZAKI KOJU (JP) 2002-08-29 US disclosed
US-6303747-B1 SELENIUM-CONTAINING POLYTHIOL HAVING 3 OR MORE FUNCTIONAL GROUPS; MONOMERS FOR PREPARING TRANSPARENT OPTICAL MATERIAL WHICH HAS HIGH REFRACTIVE INDEX, LOW DISPERSION AND EXCELLENT OPTICAL PROPERTIES MITSUI CHEMICALS, INC. (JP) 2001-10-16 US disclosed
EP-1120667-A2 Process for production of optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-08-01 EP disclosed
US-20010008278-A1 Process for production of optical material MITSUBISHI GAS CHEMICAL COMPANY, INC (JP) 2001-07-19 US disclosed
EP-1099721-A1 Composition for producing resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-05-16 EP disclosed
US-6124424-A A TRANSPARENT OPTICAL LENS IS OBTAINED BY CAST-POLYMERIZING AT LEAST ONE REACTIVE MONOMER OR OLIGOMER HAVING AT LEAST ONE SELENIUM ATOM IN ITS MOLECULE; IMPROVED REFRACTIVE INDEX MITSUI CHEMICALS, INC. (JP) 2000-09-26 US disclosed
EP-0896972-A1 SELENIZED TRANSPARENT OPTICAL MATERIAL Mitsui Chemicals, Inc. (JP) 1999-02-17 EP disclosed