SCHEMBL10259557

SCHEMBL10259557

CC/C=C\CCCCCN

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 7/20 0.46
ALDH1A1 P00352 4/20 0.46
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
TSHR P16473 1/20 0.46
EPHX1 P07099 1/20 0.46
F7 P08709 2/20 0.45
F3 P13726 2/20 0.45
MAPT P10636 2/20 0.45
CYP19A1 P11511 2/20 0.45
OXER1 Q8TDS5 1/20 0.45
KDM4E B2RXH2 1/20 0.45
FFAR1 O14842 1/20 0.45
NR1I2 O75469 1/20 0.45
LMNA P02545 1/20 0.45
PLA2G1B P04054 1/20 0.45
CYP3A4 P08684 1/20 0.45
HPGD P15428 1/20 0.45
ALOX15 P16050 1/20 0.45
PTGS1 P23219 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9556027 1.00 DNM1 (0.46) DNM1ALDH1A1MEN1KMT2ATSHR
SCHEMBL8073949 1.00 DNM1 (0.46) DNM1ALDH1A1MEN1KMT2ATSHR
SCHEMBL9212233 1.00 DNM1 (0.46) DNM1ALDH1A1MEN1KMT2ATSHR
SCHEMBL466520 1.00 DNM1 (0.46) DNM1ALDH1A1MEN1KMT2ATSHR
SCHEMBL18999844 1.00 DNM1 (0.46) DNM1ALDH1A1MEN1KMT2ATSHR
SCHEMBL9556231 1.00 DNM1 (0.46) DNM1ALDH1A1MEN1KMT2ATSHR
SCHEMBL8691765 1.00 DNM1 (0.46) DNM1ALDH1A1MEN1KMT2ATSHR
SCHEMBL8691768 1.00 DNM1 (0.46) DNM1ALDH1A1MEN1KMT2ATSHR
SCHEMBL466519 1.00 DNM1 (0.46) DNM1ALDH1A1MEN1KMT2ATSHR
SCHEMBL27728574 1.00 DNM1 (0.46) DNM1ALDH1A1MEN1KMT2ATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2012086849-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-06-28 WO disclosed