SCHEMBL1029972

SCHEMBL1029972

CCC(C)(C)[Sn]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9718373 0.70
SCHEMBL268937 0.70
SCHEMBL2153288 0.67 TSHR (1.00)
SCHEMBL1936538 0.67
SCHEMBL22537 0.67
SCHEMBL668738 0.65
Methane SCHEMBL8377146 0.63
SCHEMBL597698 0.63 TSHR (0.55)
SCHEMBL6285811 0.63 TSHR (0.55)
Ammonia Solution, Strong SCHEMBL2316956 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116655457-A Method for preparing resorcinol 万华化学集团股份有限公司 2023-08-29 CN claimed
US-12487522-B2 Organometallic solution based high resolution patterning compositions and corresponding methods INPRIA CORPORATION (US) 2025-12-02 US disclosed
US-20240337926-A1 ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS AND CORRESPONDING METHODS INPRIA CORPORATION 2024-10-10 US disclosed
US-20240280897-A1 ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS AND CORRESPONDING METHODS INPRIA CORPORATION 2024-08-22 US disclosed
EP-3889159-B1 ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS INPRIA CORP (US) 2024-06-05 EP disclosed
US-11988959-B2 Organometallic solution based high resolution patterning compositions and corresponding methods INPRIA CORPORATION (US) 2024-05-21 US disclosed
CN-112004803-B Process for the preparation of regioselective N-alkyltriazoles 科赛普特治疗公司 2023-11-03 CN disclosed
US-11795388-B2 High luminescence plastic scintillators NATIONAL TECHNOLOGY & ENGINEERING SOLUTIONS OF SANDIA, LLC (US) 2023-10-24 US disclosed
CN-116848092-A Process for preparing pyrimidine cyclohexyl glucocorticoid receptor modulators 科赛普特治疗公司 2023-10-03 CN disclosed
CN-116655457-A Method for preparing resorcinol 万华化学集团股份有限公司 2023-08-29 CN disclosed
WO-2010000504-A1 POLYMERISABLE COMPOUNDS FOR MAKING OPTO-ELECTRONIC DEVICES INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM (BE) 2010-01-07 WO disclosed
US-20080293905-A9 MULTICOORDINATED METAL COMPLEXES FOR USE IN METATHESIS REACTIONS RIMTEC CORPORATION (JP) 2008-11-27 US disclosed
WO-2007022945-A2 MULTICOORDINATED METAL COMPLEXES FOR USE IN METATHESIS REACTIONS VIACATT N.V. (BE) 2007-03-01 WO disclosed
EP-1757613-A1 Multicoordinated metal complexes for use in metathesis reactions Viacatt N.V. (BE) 2007-02-28 EP disclosed
US-20070043188-A1 MULTICOORDINATED METAL COMPLEXES FOR USE IN METATHESIS REACTIONS TELENE S.A.S. (FR) 2007-02-22 US disclosed
US-5080971-A Durable, weatherproof, wear and corrosion resistant TDK CORPORATION (JP) 1992-01-14 US disclosed
US-5069967-A Durability, thin metal film. plasma polymerized film, fluoropo lymer film TDK CORPORATION (JP) 1991-12-03 US disclosed
US-4889767-A PLASMA TREATED PROTECTIVE CARBON FILM TDK CORPORATION (JP) 1989-12-26 US disclosed
US-4880687-A Magnetic recording medium TDK CORPORATION (JP) 1989-11-14 US disclosed
US-4548864-A BASE, PLASMA POLYMERIZED SUBSTANCE, AND FERROMAGNETIC FILM TDK CORPORATION (JP) 1985-10-22 US disclosed