SCHEMBL10301344

SCHEMBL10301344

C[SiH](C)CC#CC12CC3C4CC5(C#C[Si](C)(C)C)CC3C(C1)C(C5)C4C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14489627 0.81 ALDH1A1 (0.32)
SCHEMBL13109265 0.72
SCHEMBL14556472 0.67
SCHEMBL13109255 0.58 ALDH1A1 (0.30)
SCHEMBL13628678 0.57
SCHEMBL14066964 0.53
SCHEMBL16840405 0.52
SCHEMBL22545711 0.50
SCHEMBL5881425 0.50
Bromide SCHEMBL22501336 0.49

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8216647-B2 Insulating film, process for producing the same and electronic device using the same FUJIFILM CORPORATION (JP) 2012-07-10 US disclosed
US-20110039037-A1 INSULATING FILM, PROCESS FOR PRODUCING THE SAME AND ELECTRONIC DEVICE USING THE SAME FUJIFILM CORPORATION (JP) 2011-02-17 US disclosed
US-7820748-B2 copolymer of 3,3,3',3'-triethynyl-1,1'-biadamantane, 3,3'-diethynyl-1,1'-biadamantane, 1,6-diethynyldiamantane-1,4,6,9-tetraethynyldiamantane; a solvent (gamma -butyrolactone, isopropyl alcohol); a cage type silsequioxane compound; low dielectric constan, improved in capacity FUJIFILM CORPORATION (JP) 2010-10-26 US disclosed
US-20090076204-A1 copolymer of 3,3,3',3'-triethynyl-1,1'-biadamantane, 3,3'-diethynyl-1,1'-biadamantane, 1,6-diethynyldiamantane-1,4,6,9-tetraethynyldiamantane; a solvent (gamma -butyrolactone, isopropyl alcohol); a cage type silsequioxane compound; low dielectric constan, improved in capacity FUJIFILM CORPORATION (JP) 2009-03-19 US disclosed