Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRA2C | P18825 | 1/20 | 0.30 |
| ▸ | GSK3A | P49840 | 1/20 | 0.30 |
| ▸ | GSK3B | P49841 | 1/20 | 0.30 |
| ▸ | MGLL | Q99685 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20625906 | 0.85 | — | — | |
| SCHEMBL20625884 | 0.84 | — | — | |
| SCHEMBL19337484 | 0.83 | — | — | |
| SCHEMBL12250053 | 0.79 | — | — | |
| SCHEMBL13448389 | 0.79 | — | — | |
| SCHEMBL14564574 | 0.79 | — | — | |
| SCHEMBL19702943 | 0.74 | CYP2D6 (0.33) | — | |
| SCHEMBL9612235 | 0.74 | ALDH1A1 (0.34) | — | |
| SCHEMBL14410569 | 0.74 | ALDH1A1 (0.34) | — | |
| SCHEMBL19912034 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11586108-B2 | Pattern-forming composition, film, infrared cut filter, infrared transmitting filter, solid image pickup element, infrared sensor, and camera module | FUJIFILM CORPORATION (JP) | 2023-02-21 | — | — | US | disclosed |
| US-20210173309-A1 | METHOD OF FORMING REVERSED PATTERN AND METHOD OF MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2021-06-10 | — | — | US | disclosed |
| US-20200218150-A1 | PATTERN-FORMING COMPOSITION, FILM, INFRARED CUT FILTER, INFRARED TRANSMITTING FILTER, SOLID IMAGE PICKUP ELEMENT, INFRARED SENSOR, AND CAMERA MODULE | FUJIFILM CORPORATION (JP) | 2020-07-09 | — | — | US | disclosed |
| US-10678132-B2 | Resin for hydrophobilizing resist surface, method for production thereof, and positive resist composition containing the resin | FUJIFILM CORPORATION (JP) | 2020-06-09 | — | — | US | disclosed |
| US-20200124963-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2020-04-23 | — | — | US | disclosed |
| US-10017696-B2 | Thermosetting composition with photo-alignment property, alignment layer, substrate with alignment layer, retardation plate, and device | DAI NIPPON PRINTING CO., LTD. (JP) | 2018-07-10 | — | — | US | disclosed |
| US-9023576-B2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2015-05-05 | — | — | US | disclosed |
| US-20130020684-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20120322007-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-12-20 | — | — | US | disclosed |
| US-20120178894-A1 | COMPOUND HAVING SILSESQUIOXANE SKELETON AND ITS POLYMER | INAGAKI JYUN-ICHI (JP) | 2012-07-12 | — | — | US | disclosed |
| US-20100240855-A1 | Compound having silsesquioxane skeleton and its polymer | JNC CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| US-20100009288-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING SAME | FUJIFILM CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2141183-A1 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same | Fujifilm Corporation (JP) | 2010-01-06 | — | — | EP | disclosed |
| WO-2008093856-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-08-07 | — | — | WO | disclosed |
| EP-1518908-B1 | Ink composition for electrostatic ink-jet recording and method of ink-jet recording | FUJIFILM CORP (JP) | 2007-05-30 | — | — | EP | disclosed |