⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10312440 | 0.92 | — | — | |
| SCHEMBL10312461 | 0.84 | — | — | |
| SCHEMBL10312417 | 0.83 | — | — | |
| SCHEMBL17339981 | 0.81 | — | — | |
| SCHEMBL775691 | 0.81 | ALDH1A1 (0.33) | — | |
| SCHEMBL9891416 | 0.81 | — | — | |
| SCHEMBL10312447 | 0.81 | — | — | |
| SCHEMBL10312443 | 0.81 | — | — | |
| SCHEMBL776006 | 0.81 | — | — | |
| SCHEMBL17929915 | 0.80 | PPP5C (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8481243-B2 | Resin and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-07-09 | — | — | US | disclosed |
| US-20120178021-A1 | RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-07-12 | — | — | US | disclosed |
| US-20120178021-A1 | RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-07-12 | — | — | US | disclosed |