Isopropyl Alcohol

Isopropyl Alcohol

SCHEMBL10340482

CC(=O)OCCC(C)C.CC(C)O

nearest known ligand 0.91

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 1/20 0.50
CA12 O43570 1/20 0.45
CA1 P00915 1/20 0.45
CA2 P00918 1/20 0.45
CA9 Q16790 1/20 0.45
ALDH1A1 P00352 5/20 0.44
CHRM5 P08912 2/20 0.43
CHRM1 P11229 2/20 0.43
CHRM3 P20309 2/20 0.43
PGR P06401 1/20 0.43
CHRM2 P08172 1/20 0.43
CHRM4 P08173 1/20 0.43
HTR1A P08908 1/20 0.43
CHRNB2 P17787 1/20 0.43
TBXA2R P21731 1/20 0.43
CHRNB4 P30926 1/20 0.43
CHRNA3 P32297 1/20 0.43
CHRNA7 P36544 1/20 0.43
CHRNA4 P43681 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL901254 0.95 ALOX15 (0.53) ALOX15CA12CA1CA2CA9
SCHEMBL27086 0.95
SCHEMBL31411095 0.93 ALOX15 (0.52) ALOX15CA12CA1CA2CA9
SCHEMBL28563022 0.93 ALOX15 (0.52) ALOX15CA12CA1CA2CA9
SCHEMBL27515083 0.93 ALOX15 (0.52) ALOX15CA12CA1CA2CA9
Methane SCHEMBL766234 0.93 ALOX15 (0.52) ALOX15CA12CA1CA2CA9
Acetone SCHEMBL7637226 0.93 ALOX15 (0.52) ALOX15CA12CA1CA2CA9
SCHEMBL28341214 0.93 ALOX15 (0.52) ALOX15CA12CA1CA2CA9
Methyl Alcohol SCHEMBL6663691 0.93 ALOX15 (0.52) ALOX15CA12CA1CA2CA9
Butanedione SCHEMBL2218929 0.91 ALOX15 (0.50) ALOX15CA12CA1CA2CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0211161-B1 LITHOGRAPHIC RESISTS AND METHOD OF USING THE SAME International Business Machines Corporation (US) 1990-02-28 EP disclosed
US-4665006-A Positive resist system having high resistance to oxygen reactive ion etching INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1987-05-12 US disclosed
EP-0211161-A1 Lithographic resists and method of using the same International Business Machines Corporation (US) 1987-02-25 EP disclosed