Sugi Predict

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Acrylic Acid

Acrylic Acid

SCHEMBL10347249

C=C(C)C(=O)OC1CCCCC1.C=CC(=O)O

nearest known ligand 0.39

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Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ EPHX1 P07099 2/20 0.39
▸ NAAA Q02083 2/20 0.36
▸ HTT P42858 1/20 0.35
▸ LMNA P02545 1/20 0.34
▸ ALDH1A1 P00352 2/20 0.33
▸ CYP2C19 P33261 1/20 0.33
▸ TDP1 Q9NUW8 1/20 0.33
▸ CA12 O43570 1/20 0.32
▸ CA1 P00915 1/20 0.32
▸ CA2 P00918 1/20 0.32
▸ CA9 Q16790 1/20 0.32
▸ CYP19A1 P11511 2/20 0.32
▸ FABP7 O15540 1/20 0.32
▸ FABP5 Q01469 1/20 0.32
▸ SMN1; SMN2 Q16637 1/20 0.31
▸ GPR35 Q9HC97 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid SCHEMBL3912759 0.95 LMNA (0.36) EPHX1NAAALMNAALDH1A1
SCHEMBL28077597 0.91 EPHX1 (0.40) EPHX1NAAAHTTALDH1A1CYP2C19
Maleic Acid SCHEMBL27868428 0.90 HTT (0.40) EPHX1NAAAHTTLMNAALDH1A1
SCHEMBL28113038 0.89 EPHX1 (0.41) EPHX1NAAAHTTALDH1A1CYP2C19
Bicarbonate SCHEMBL13570854 0.89 EPHX1 (0.43) EPHX1NAAAHTTALDH1A1CYP2C19
SCHEMBL887989 0.89 EPHX1 (0.46) EPHX1NAAAHTTALDH1A1CYP2C19
SCHEMBL18822970 0.89 EPHX1 (0.46) EPHX1NAAAHTTALDH1A1CYP2C19
SCHEMBL28878275 0.89 EPHX1 (0.46) EPHX1NAAAHTTALDH1A1CYP2C19
SCHEMBL22480 0.89 EPHX1 (0.46) EPHX1NAAAHTTALDH1A1CYP2C19
SCHEMBL1052594 0.89 EPHX1 (0.46) EPHX1NAAAHTTALDH1A1CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117590694-A Photosensitive resin composition, photosensitive resist laminate and application thereof 杭州福斯特电子材料有限公司 2024-02-23 — — CN disclosed
CN-105866871-B Composite polarizing plate and liquid crystal display device 住友化学株式会社 2020-05-05 — — CN disclosed
CN-109564387-A Highly sensitive oxime ester photopolymerization initiator and photopolymerizable composition comprising the same 韩国化学研究院 2019-04-02 — — CN disclosed
CN-107001653-A Method for producing composite article 陶氏环球技术有限责任公司 2017-08-01 — — CN disclosed
CN-104204008-B Polymer, method and composition DSM IP ASSETS B.V. (NL) 2016-11-30 — — CN disclosed
CN-103228366-B There is hole workpiece dipping method and from workpiece, remove the cleaning device that impregnating agent is remaining VDT VAKUUMDICHTTECHNIK GMBH (DE) 2016-11-30 — — CN disclosed
CN-104245762-A Polymer, process and composition DSM IP ASSETS BV 2014-12-24 — — CN disclosed
CN-104220471-A Polymeric beads, process and composition DSM IP ASSETS BV 2014-12-17 — — CN disclosed
CN-104204008-A Polymer, process and composition DSM IP ASSETS BV 2014-12-10 — — CN disclosed
CN-104204080-A Use of a polymer composition DSM IP ASSETS BV 2014-12-10 — — CN disclosed
CN-101103310-B Material for pattern formation, apparatus for pattern formation, and method for pattern formation FUJI FILM CORP 2012-03-14 — — CN disclosed
EP-0240258-B1 A PROCESS FOR MANUFACTURING MICROCAPSULES APPLETON PAPERS INC. (US) 1990-05-16 — — EP disclosed
EP-0240258-A2 A process for manufacturing microcapsules APPLETON PAPERS INC. (US) 1987-10-07 — — EP disclosed
US-4675249-A ENCAPSULATION USING AN ACRYLIC ACID-ALKYL METHACRYLATE POLYME R EMULSIFIER AND AMINO RESIN; CARBON-LESS COPIES APPLETON PAPERS INC. (US) 1987-06-23 — — US disclosed
US-4436887-A CONTACT LENSES, OXYGEN PERMEABILITY BAUSCH & LOMB INCORPORATED (US) 1984-03-13 — — US disclosed