⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL514039 | 0.90 | — | — | |
| SCHEMBL3755258 | 0.90 | — | — | |
| Bromide SCHEMBL14954180 | 0.87 | — | — | |
| Fluoride SCHEMBL14954470 | 0.87 | — | — | |
| Iodide SCHEMBL14953843 | 0.87 | — | — | |
| Hydrochloric Acid SCHEMBL14953949 | 0.87 | — | — | |
| SCHEMBL14953862 | 0.87 | — | — | |
| Carbon Monoxide SCHEMBL10605970 | 0.83 | — | — | |
| SCHEMBL4259919 | 0.74 | — | — | |
| SCHEMBL4195422 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9223203-B2 | Microcontact printed films as an activation layer for selective atomic layer deposition | ASM INTERNATIONAL N.V. (NL) | 2015-12-29 | — | — | US | disclosed |
| US-20130011557-A1 | MICROCONTACT PRINTED FILMS AS AN ACTIVATION LAYER FOR SELECTIVE ATOMIC LAYER DEPOSITION | ASM INTERNATIONAL N.V. (NL) | 2013-01-10 | — | — | US | disclosed |
| US-20110020546-A1 | Low Temperature ALD of Noble Metals | ASM INTERNATIONAL N.V. (NL) | 2011-01-27 | — | — | US | disclosed |
| EP-1471567-B1 | Organometallic iridium compounds, processes for producing the same, and processes for producing thin films | TOSOH CORP (JP) | 2009-03-11 | — | — | EP | disclosed |
| US-6884902-B2 | Organometallic iridium compound, process of producing the same, and process of producing thin film | TOSOH CORPORATION (JP) | 2005-04-26 | — | — | US | disclosed |
| US-20040215029-A1 | Novel organometallic iridium compound, process of producing the same, and process of producing thin film | TOSOH CORPORATION | 2004-10-28 | — | — | US | disclosed |
| EP-1471567-A1 | Organometallic iridium compounds, processes for producing the same, and processes for producing thin films | Tosoh Corporation (JP) | 2004-10-27 | — | — | EP | disclosed |