⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Iodide SCHEMBL14953843 | 0.97 | — | — | |
| Hydrochloric Acid SCHEMBL14953949 | 0.97 | — | — | |
| Fluoride SCHEMBL14954470 | 0.97 | — | — | |
| Bromide SCHEMBL14954180 | 0.97 | — | — | |
| SCHEMBL14953862 | 0.97 | — | — | |
| SCHEMBL514039 | 0.95 | — | — | |
| Carbon Monoxide SCHEMBL10605970 | 0.92 | — | — | |
| SCHEMBL1042996 | 0.90 | — | — | |
| SCHEMBL8162371 | 0.69 | — | — | |
| SCHEMBL216231 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12356641-B2 | Method of manufacturing metal-insulator-metal (MIM) capacitors with noble metal electrode liners | ASM IP HOLDING B.V. (NL) | 2025-07-08 | — | — | US | disclosed |
| US-20230006031-A1 | METHOD OF MANUFACTURING METAL-INSULATOR-METAL (MIM) CAPACITORS WITH NOBLE METAL ELECTRODE LINERS | ASM IP HOLDING B.V. (NL) | 2023-01-05 | — | — | US | disclosed |
| CN-115547993-A | Method of fabricating metal-insulator-metal (MIM) capacitor | ASM IP私人控股有限公司 | 2022-12-30 | — | — | CN | disclosed |
| US-9276210-B1 | Conductive barriers for ternary nitride thin-film resistors | INTERMOLECULAR, INC. (US) | 2016-03-01 | — | — | US | disclosed |
| US-20100288995-A1 | SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME | KABUSHIKI KAISHA TOSHIBA (JP) | 2010-11-18 | — | — | US | disclosed |