Butadiene

Butadiene

SCHEMBL10431900

C=CC=C.O[SiH2]O

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Butadiene SCHEMBL11197818 0.76
Butadiene SCHEMBL11854764 0.74 TRPA1 (0.44)
Butadiene SCHEMBL10457929 0.74 TRPA1 (0.44)
Butadiene SCHEMBL250 0.74
Butadiene SCHEMBL461643 0.74
Butadiene SCHEMBL11480793 0.74 TRPA1 (0.44)
Butadiene SCHEMBL10885944 0.71
Butadiene SCHEMBL5960939 0.71
Butadiene SCHEMBL23406461 0.68
Butadiene SCHEMBL3122214 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0377175-A2 Pattern forming composition and process for forming pattern using the same HITACHI, LTD. (JP) 1990-07-11 EP disclosed