SCHEMBL10457142

SCHEMBL10457142

C=C(C)C(=O)NC1CN1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21578336 0.75
SCHEMBL368410 0.71
SCHEMBL5828453 0.68 FUCA1 (0.36)
SCHEMBL15386135 0.68 EPHX1 (0.57)
SCHEMBL10455986 0.68
SCHEMBL22677485 0.68 SMN1; SMN2 (0.56)
SCHEMBL6436067 0.68 SMN1; SMN2 (0.62)
SCHEMBL10456936 0.68
SCHEMBL23506579 0.67 NPC1 (0.67)
SCHEMBL585161 0.67 NPC1 (0.67)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1499667-B1 COATING COMPOSITION FOR MULTIPLE HYDROPHILIC APPLICATIONS HYDROMER INC (US) 2013-08-14 EP claimed
US-4900795-A PHOTOPOLMERIZABLE POLYMER COMPRISING ETHYLENE, (METH)ACRYLIC ACID AND VINYL OR ACRYLATE MONOMER NEUTRALIZED BY A CYCLIC AMINE OR HYDROXY-CONTAINING AMINE; PHOTORESISTS; PRINTING PLATES; OZONE RESISTANCE; ELONGATION; TENSILE STRENGTH BASF AKTIENGESELLSCHAFT (DE) 1990-02-13 US disclosed