⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5508982 | 0.70 | — | — | |
| SCHEMBL16268502 | 0.67 | — | — | |
| SCHEMBL163513 | 0.67 | — | — | |
| SCHEMBL15141903 | 0.67 | ALDH1A1 (0.33) | — | |
| SCHEMBL2876586 | 0.64 | — | — | |
| Hydrochloric Acid SCHEMBL2187615 | 0.64 | — | — | |
| SCHEMBL14025077 | 0.64 | — | — | |
| Ammonia Solution, Strong SCHEMBL2784565 | 0.64 | — | — | |
| SCHEMBL21100089 | 0.64 | — | — | |
| Ammonia Solution, Strong SCHEMBL7500908 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250313953-A1 | METHODS AND SYSTEMS FOR FORMING DOPED SILICON NITRIDE FILMS | ASM IP HOLDING B.V. (NL) | 2025-10-09 | — | — | US | claimed |
| US-20250297360-A1 | SUBSTRATE PROCESSING METHOD | ASM IP HOLDING B.V. (NL) | 2025-09-25 | — | — | US | claimed |
| US-12392038-B2 | Thin-film deposition method and system | ASM IP HOLDING B.V. (NL) | 2025-08-19 | — | — | US | claimed |
| US-20250253145-A1 | SUBSTRATE PROCESSING METHOD | ASM IP HOLDING B.V. (NL) | 2025-08-07 | — | — | US | claimed |
| US-12378667-B2 | Methods and systems for forming doped silicon nitride films | ASM IP HOLDING B.V. (NL) | 2025-08-05 | — | — | US | claimed |
| US-20230126516-A1 | METHODS AND SYSTEMS FOR FORMING DOPED SILICON NITRIDE FILMS | ASM IP HOLDING B.V. (NL) | 2023-04-27 | — | — | US | claimed |
| US-20230089397-A1 | AIR GAP FORMING METHOD AND SELECTIVE DEPOSITION METHOD | ASM IP HOLDING B.V. (NL) | 2023-03-23 | — | — | US | claimed |
| US-9887080-B2 | Method of forming SiOCN material layer and method of fabricating semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-02-06 | — | — | US | claimed |
| US-20170186603-A1 | METHOD OF FORMING SiOCN MATERIAL LAYER AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-06-29 | — | — | US | claimed |
| JP-2010539730-A | — | — | 2010-12-16 | — | — | JP | claimed |
| EP-2193541-A1 | METHOD OF FORMING SILICON-CONTAINING FILMS | L'AIR LIQUIDE, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2010-06-09 | — | — | EP | claimed |
| WO-2009039251-A1 | METHOD OF FORMING SILICON-CONTAINING FILMS | L'AIR LIQUIDE - SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2009-03-26 | — | — | WO | claimed |
| US-20090075490-A1 | METHOD OF FORMING SILICON-CONTAINING FILMS | L'AIR LIQUITE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2009-03-19 | — | — | US | claimed |
| US-20260092360-A1 | CYCLICAL DEPOSITION METHOD INCLUDING TREATMENT STEP AND APPARATUS FOR SAME | ASM IP HOLDING BV (NL) | 2026-04-02 | — | — | US | disclosed |
| US-20250313953-A1 | METHODS AND SYSTEMS FOR FORMING DOPED SILICON NITRIDE FILMS | ASM IP HOLDING B.V. (NL) | 2025-10-09 | — | — | US | disclosed |
| US-20250297360-A1 | SUBSTRATE PROCESSING METHOD | ASM IP HOLDING B.V. (NL) | 2025-09-25 | — | — | US | disclosed |
| US-20080058541-A1 | Stabilization of nitrogen-containing and oxygen-containing organosilanes using weakly basic ion-exchange resins | VERSUM MATERIALS US, LLC | 2008-03-06 | — | — | US | disclosed |
| EP-1894934-A1 | Stabilization of Nitrogen-Containing and Oxygen-Containing Organosilanes Using Weakly Basic Ion-Exchange Resins | Air Products and Chemicals, Inc. (US) | 2008-03-05 | — | — | EP | disclosed |
| EP-1724373-A1 | Precursors for cvd silicon carbo-nitride films | Air Products and Chemicals, Inc. (US) | 2006-11-22 | — | — | EP | disclosed |
| US-20060258173-A1 | Precursors for CVD silicon carbo-nitride films | VERSUM MATERIALS US, LLC | 2006-11-16 | — | — | US | disclosed |