SCHEMBL10488385

SCHEMBL10488385

CN(C)c1ccc(C=Cc2nc3ccc(S(=O)(=O)N=[N+]=[N-])cc3[nH]2)cc1

nearest known ligand 0.58

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 4/20 0.58
▸ APP P05067 3/20 0.58
▸ TRPV1 Q8NER1 13/20 0.55
▸ MEN1 O00255 3/20 0.45
▸ KMT2A Q03164 3/20 0.45
▸ NPC1 O15118 2/20 0.45
▸ RAB9A P51151 2/20 0.45
▸ KLF5 Q13887 1/20 0.45
▸ LMNA P02545 2/20 0.44
▸ HTT P42858 1/20 0.41
▸ NPSR1 Q6W5P4 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10488379 1.00 MAPT (0.58) MAPTAPPTRPV1MEN1KMT2A
SCHEMBL10488396 0.92 MAPT (0.50) MAPTAPPTRPV1MEN1KMT2A
SCHEMBL10488487 0.78 INSR (0.63) MAPTAPPMEN1KMT2ANPC1
SCHEMBL10488485 0.78 INSR (0.63) MAPTAPPMEN1KMT2ANPC1
SCHEMBL8769080 0.74 MAPT (0.70) MAPTAPPTRPV1MEN1KMT2A
SCHEMBL13836428 0.74 MAPT (0.70) MAPTAPPTRPV1MEN1KMT2A
SCHEMBL17544359 0.74 APP (1.00) MAPTAPPTRPV1MEN1KMT2A
SCHEMBL30548525 0.74 APP (1.00) MAPTAPPTRPV1MEN1KMT2A
SCHEMBL17544358 0.74 APP (1.00) MAPTAPPTRPV1MEN1KMT2A
SCHEMBL5133585 0.71 IDO1 (0.48) MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4835089-A Resist pattern forming process with dry etching HITACHI, LTD. (JP) 1989-05-30 — — US claimed
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