⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6397430 | 0.72 | — | — | |
| SCHEMBL15608513 | 0.72 | — | — | |
| SCHEMBL1049209 | 0.71 | — | — | |
| SCHEMBL2202603 | 0.67 | LMNA (0.30) | — | |
| SCHEMBL1052175 | 0.67 | — | — | |
| SCHEMBL4007126 | 0.65 | LMNA (0.35) | — | |
| SCHEMBL6901636 | 0.64 | — | — | |
| SCHEMBL21643726 | 0.64 | — | — | |
| SCHEMBL8576117 | 0.64 | LMNA (0.39) | — | |
| SCHEMBL2490915 | 0.64 | LMNA (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112095343-A | Super-hydrophobic and super-oleophilic self-cleaning cotton fabric and preparation method and application thereof | 深圳大学 | 2020-12-18 | — | — | CN | claimed |
| CN-112095343-B | Super-hydrophobic and super-oleophylic self-cleaning cotton fabric and preparation method and application thereof | 深圳大学 | 2023-01-10 | — | — | CN | disclosed |
| CN-112095343-B | Super-hydrophobic and super-oleophylic self-cleaning cotton fabric and preparation method and application thereof | 深圳大学 | 2023-01-10 | — | — | CN | disclosed |
| CN-112095343-A | Super-hydrophobic and super-oleophilic self-cleaning cotton fabric and preparation method and application thereof | 深圳大学 | 2020-12-18 | — | — | CN | disclosed |
| CN-112095343-A | Super-hydrophobic and super-oleophilic self-cleaning cotton fabric and preparation method and application thereof | 深圳大学 | 2020-12-18 | — | — | CN | disclosed |
| EP-3141538-B1 | IMPROVED PROCESS STABILITY OF NBDE USING SUBSTITUTED PHENOL STABILIZERS | VERSUM MAT US LLC (US) | 2019-10-30 | — | — | EP | disclosed |
| EP-2318477-B1 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MAT USA INC (US) | 2019-06-05 | — | — | EP | disclosed |
| EP-3141538-A1 | IMPROVED PROCESS STABILITY OF NBDE USING SUBSTITUTED PHENOL STABILIZERS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2017-03-15 | — | — | EP | disclosed |
| EP-2141141-B1 | Improved Process Stability of NBDE Using Substituted Phenol Stabilizers | AIR PROD & CHEM (US) | 2016-09-28 | — | — | EP | disclosed |
| EP-1931746-B1 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS (US) | 2013-09-04 | — | — | EP | disclosed |
| WO-2007033075-A9 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2010-04-29 | — | — | WO | disclosed |
| EP-2141141-A1 | Improved Process Stability of NBDE Using Substituted Phenol Stabilizers | Air Products and Chemicals, Inc. (US) | 2010-01-06 | — | — | EP | disclosed |
| US-20090297711-A1 | Process Stability of NBDE Using Substituted Phenol Stabilizers | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-12-03 | — | — | US | disclosed |
| US-20090291210-A1 | Additives to Prevent Degradation of Cyclic Alkene Derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2009-11-26 | — | — | US | disclosed |
| EP-1931613-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FujiFilm Electronic Materials USA, Inc. (US) | 2008-06-18 | — | — | EP | disclosed |
| EP-1931746-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FujiFilm Electronic Materials USA, Inc. (US) | 2008-06-18 | — | — | EP | disclosed |
| WO-2007033075-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2007-03-22 | — | — | WO | disclosed |
| WO-2007033123-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2007-03-22 | — | — | WO | disclosed |
| US-20070057235-A1 | Additives to prevent degradation of cyclic alkene derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2007-03-15 | — | — | US | disclosed |
| US-20070057234-A1 | Additives to prevent degradation of cyclic alkene derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2007-03-15 | — | — | US | disclosed |