SCHEMBL1052893

SCHEMBL1052893

FC(F)(F)CCO[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL918861 0.81
SCHEMBL2928523 0.81
SCHEMBL1054631 0.75
SCHEMBL648428 0.72
SCHEMBL15910182 0.69 MEN1 (0.32)
SCHEMBL13448587 0.69
SCHEMBL5788572 0.68 LMNA (0.31)
SCHEMBL10465181 0.68
SCHEMBL1149105 0.67
SCHEMBL6327256 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118908753-B Antibacterial ceramic tile and preparation method and application thereof 广东新润成陶瓷有限公司 2025-01-14 CN claimed
CN-118908753-A Antibacterial ceramic tile and preparation method and application thereof 广东新润成陶瓷有限公司 2024-11-08 CN claimed
CN-117247288-B Ceramic tile with antibacterial function and preparation method thereof 佛山欧神诺陶瓷有限公司 2024-02-09 CN claimed
CN-117247288-A Ceramic tile with antibacterial function and preparation method thereof 佛山欧神诺陶瓷有限公司 2023-12-19 CN claimed
US-12269266-B2 Nozzle plate including substrate adhesion layer between base layer and substrate, and inkjet head equipped with said nozzle plate Konica Minolta, Inc. (JP) 2025-04-08 US disclosed
EP-4205983-B1 NOZZLE PLATE AND INKJET HEAD KONICA MINOLTA INC (JP) 2025-02-12 EP disclosed
CN-118908753-B Antibacterial ceramic tile and preparation method and application thereof 广东新润成陶瓷有限公司 2025-01-14 CN disclosed
CN-118908753-A Antibacterial ceramic tile and preparation method and application thereof 广东新润成陶瓷有限公司 2024-11-08 CN disclosed
CN-117247288-B Ceramic tile with antibacterial function and preparation method thereof 佛山欧神诺陶瓷有限公司 2024-02-09 CN disclosed
US-20230415481-A1 NOZZLE PLATE AND INKJET HEAD Konica Minolta, Inc. (JP) 2023-12-28 US disclosed
CN-117247288-A Ceramic tile with antibacterial function and preparation method thereof 佛山欧神诺陶瓷有限公司 2023-12-19 CN disclosed
EP-4230631-A2 PROCESS FOR MAKING TRISUBSTITUTED SILYLOXYETHYL TRIFLATES Synthon B.V. (NL) 2023-08-23 EP disclosed
US-20090297711-A1 Process Stability of NBDE Using Substituted Phenol Stabilizers AIR PRODUCTS AND CHEMICALS, INC. (US) 2009-12-03 US disclosed
US-20090291210-A1 Additives to Prevent Degradation of Cyclic Alkene Derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2009-11-26 US disclosed
EP-1931613-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FujiFilm Electronic Materials USA, Inc. (US) 2008-06-18 EP disclosed
EP-1931746-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FujiFilm Electronic Materials USA, Inc. (US) 2008-06-18 EP disclosed
WO-2007033075-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2007-03-22 WO disclosed
WO-2007033123-A2 ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2007-03-22 WO disclosed
US-20070057235-A1 Additives to prevent degradation of cyclic alkene derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2007-03-15 US disclosed
US-20070057234-A1 Additives to prevent degradation of cyclic alkene derivatives FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2007-03-15 US disclosed