⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3368064 | 0.81 | — | — | |
| SCHEMBL8665521 | 0.79 | — | — | |
| SCHEMBL705839 | 0.77 | — | — | |
| SCHEMBL2788078 | 0.77 | — | — | |
| SCHEMBL692448 | 0.75 | — | — | |
| SCHEMBL10714079 | 0.73 | — | — | |
| SCHEMBL703383 | 0.72 | — | — | |
| SCHEMBL706691 | 0.72 | — | — | |
| SCHEMBL6708448 | 0.70 | TSHR (0.30) | — | |
| SCHEMBL6708436 | 0.70 | TSHR (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9228035-B2 | Photo-curable nanoimprint composition, method for formatting pattern using the composition, and nanoimprint replica mold comprising cured product of the composition | TOKUYAMA CORPORATION (JP) | 2016-01-05 | — | — | US | disclosed |
| US-9177819-B2 | Method for manufacturing silicon substrate having textured structure | TOKUYAMA CORPORATION (JP) | 2015-11-03 | — | — | US | disclosed |
| US-20140349485-A1 | METHOD FOR MANUFACTURING SILICON SUBSTRATE HAVING TEXTURED STRUCTURE | TOKUYAMA CORPORATION a corporation | 2014-11-27 | — | — | US | disclosed |
| EP-2631932-A1 | PHOTO-CURABLE NANOIMPRINT COMPOSITION, METHOD FOR FORMING PATTERN USING THE COMPOSITION, AND NANOIMPRINT REPLICA MOLD COMPRISING CURED PRODUCT OF COMPOSITION | Tokuyama Corporation (JP) | 2013-08-28 | — | — | EP | disclosed |
| US-20130214453-A1 | PHOTO-CURABLE NANOIMPRINT COMPOSITION, METHOD FOR FORMATING PATTERN USING THE COMPOSITION, AND NANOIMPRINT REPLICA MOLD COMRISING CURED PRODUCT OF THE COMPOSITION | TOKUYAMA CORPORATION (JP) | 2013-08-22 | — | — | US | disclosed |
| US-4814407-A | A SILANOL, SILANEDIOL OR SILANETRIOL AND AN ACID SCAVENGER | PCR, INC. (US) | 1989-03-21 | — | — | US | disclosed |
| US-4649063-A | Method for waterproofing silica-ceramic insulation bodies | SCM CORPORATION (US) | 1987-03-10 | — | — | US | disclosed |